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| Format: | Preprint |
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2026
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| Online-Zugang: | https://arxiv.org/abs/2602.11970 |
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| _version_ | 1866911444330610688 |
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| author | Salah, Sarah Atlam, Ahmed Elkahwagy, Nagat Elshaer, Abdelhamid Shihab, Mohammed |
| author_facet | Salah, Sarah Atlam, Ahmed Elkahwagy, Nagat Elshaer, Abdelhamid Shihab, Mohammed |
| contents | Fluorine-doped tin oxide (FTO) is a key transparent conductive oxide for photovoltaic and optoelectronic devices, yet its high reflectance limits light-trapping efficiency. This work demonstrates a simple DC plasma sputtering approach to deposit carbonaceous Al2O3 microdots on FTO under controlled Ar, O2, and Ar-O2 atmospheres. For plasma discharge in the normal mode, with plasma density 10^9 cm^-3 and temperature of 2 eV, Volmer-Weber growth produced discrete microdots whose size and distribution were tuned by gas composition: dense, uniform dots in Ar (approximately 0.89 um radius), agglomerated structures in O2, and intermediate morphologies in mixed atmospheres. Structural analysis confirmed Al2O3 formation with carbon incorporation, while SEM revealed morphology-driven optical behavior. UV-Vis measurements showed that Ar-O2 coatings achieved the lowest reflectance across the visible range, outperforming bare FTO and other conditions. These findings establish a clear link between sputtering parameters, surface morphology, and optical performance, offering a scalable route to anti-reflective, light-trapping coatings for next-generation solar cells and optoelectronic devices. |
| format | Preprint |
| id |
arxiv_https___arxiv_org_abs_2602_11970 |
| institution | arXiv |
| publishDate | 2026 |
| record_format | arxiv |
| spellingShingle | Tuning Optical Properties of FTO via Carbonaceous Al2O3 Microdot Deposition by DC plasma sputtering Salah, Sarah Atlam, Ahmed Elkahwagy, Nagat Elshaer, Abdelhamid Shihab, Mohammed Plasma Physics Materials Science Fluorine-doped tin oxide (FTO) is a key transparent conductive oxide for photovoltaic and optoelectronic devices, yet its high reflectance limits light-trapping efficiency. This work demonstrates a simple DC plasma sputtering approach to deposit carbonaceous Al2O3 microdots on FTO under controlled Ar, O2, and Ar-O2 atmospheres. For plasma discharge in the normal mode, with plasma density 10^9 cm^-3 and temperature of 2 eV, Volmer-Weber growth produced discrete microdots whose size and distribution were tuned by gas composition: dense, uniform dots in Ar (approximately 0.89 um radius), agglomerated structures in O2, and intermediate morphologies in mixed atmospheres. Structural analysis confirmed Al2O3 formation with carbon incorporation, while SEM revealed morphology-driven optical behavior. UV-Vis measurements showed that Ar-O2 coatings achieved the lowest reflectance across the visible range, outperforming bare FTO and other conditions. These findings establish a clear link between sputtering parameters, surface morphology, and optical performance, offering a scalable route to anti-reflective, light-trapping coatings for next-generation solar cells and optoelectronic devices. |
| title | Tuning Optical Properties of FTO via Carbonaceous Al2O3 Microdot Deposition by DC plasma sputtering |
| topic | Plasma Physics Materials Science |
| url | https://arxiv.org/abs/2602.11970 |