Influence of electrical properties on thermal boundary conductance at metal/semiconductor interface
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arXiv
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| Main Authors: | , , , , , , , , , , , , |
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| Format: | Preprint |
| Published: |
2026
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| _version_ | 1866911456512966656 |
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| author | Pompidou, Quentin Abanto, Juan Carlos Acosta Brouillard, M. Bercu, Nicolas Giraudet, L. Sheikh, Rami Adessi, C. Mérabia, S. Gomès, S. Chapuis, Pierre-Olivier Robillard, J. -F. Chirtoc, Mihai Horny, N. |
| author_facet | Pompidou, Quentin Abanto, Juan Carlos Acosta Brouillard, M. Bercu, Nicolas Giraudet, L. Sheikh, Rami Adessi, C. Mérabia, S. Gomès, S. Chapuis, Pierre-Olivier Robillard, J. -F. Chirtoc, Mihai Horny, N. |
| contents | Recent experimental investigations have demonstrated that doping a semiconductor is a route to increase the thermal boundary conductance at metal/semiconductor interfaces. In this work, the influence of the electrical properties on heat transfer across metal/doped semiconductor junctions is investigated. Specifically, thermal boundary conductance at the interfaces between p- and n-doped silicon and titanium is measured by employing frequency-domain photothermal radiometry under varying external conditions. The influence of the doping level of the semiconductor, the barrier height, and the space charge area is analyzed. In particular, a 40% increase in the interface thermal conductance with the application of a current at n-doped silicon/titanium interfaces is reported. The enhancement of the thermal boundary conductance is explained by the shrinking of the surface charga area induced by the electric current. This study opens the way to modulating interfacial heat transfer at metal/semiconductor interfaces through fine tuning of electrical effects. |
| format | Preprint |
| id |
arxiv_https___arxiv_org_abs_2602_16725 |
| institution | arXiv |
| publishDate | 2026 |
| record_format | arxiv |
| spellingShingle | Influence of electrical properties on thermal boundary conductance at metal/semiconductor interface Pompidou, Quentin Abanto, Juan Carlos Acosta Brouillard, M. Bercu, Nicolas Giraudet, L. Sheikh, Rami Adessi, C. Mérabia, S. Gomès, S. Chapuis, Pierre-Olivier Robillard, J. -F. Chirtoc, Mihai Horny, N. Mesoscale and Nanoscale Physics Classical Physics Recent experimental investigations have demonstrated that doping a semiconductor is a route to increase the thermal boundary conductance at metal/semiconductor interfaces. In this work, the influence of the electrical properties on heat transfer across metal/doped semiconductor junctions is investigated. Specifically, thermal boundary conductance at the interfaces between p- and n-doped silicon and titanium is measured by employing frequency-domain photothermal radiometry under varying external conditions. The influence of the doping level of the semiconductor, the barrier height, and the space charge area is analyzed. In particular, a 40% increase in the interface thermal conductance with the application of a current at n-doped silicon/titanium interfaces is reported. The enhancement of the thermal boundary conductance is explained by the shrinking of the surface charga area induced by the electric current. This study opens the way to modulating interfacial heat transfer at metal/semiconductor interfaces through fine tuning of electrical effects. |
| title | Influence of electrical properties on thermal boundary conductance at metal/semiconductor interface |
| topic | Mesoscale and Nanoscale Physics Classical Physics |
| url | https://arxiv.org/abs/2602.16725 |