Graphene FET Process and Analysis Optimization in 200 mm Pilot Line Environment

Fuente: arXiv
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Bibliographic Details
Main Authors: Murros, Anton, Soikkeli, Miika, Virta, Anni, Maestre, Arantxa, Morillo, Leire, Centeno, Alba, Zurutuza, Amaia, Kilpi, Olli-Pekka
Format: Preprint
Published: 2026
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