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Main Authors: Roy, Subhankar, Hu, Jianping, Momeen, M Ummal
Format: Preprint
Published: 2026
Subjects:
Online Access:https://arxiv.org/abs/2602.19417
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author Roy, Subhankar
Hu, Jianping
Momeen, M Ummal
author_facet Roy, Subhankar
Hu, Jianping
Momeen, M Ummal
contents To overcome the limit of diffraction while achieving the superresolution technique, solid immersion lenses are the key optical elements for data storage and nanophotonics applications. Recent demonstrations have shown how different nanostructures (such as elliptical SILs) are used in diverse fields of increasing resolution in the presence of a structured Gaussian beam. By applying twisted beams such as angular momentum beams (Laguerre- Gaussian) and spatial higher-order Gaussian beams (Hermite- Gauss), we can attain a sharp (FWHM = 27 nm) near-field focal spot pattern, which is considerably better than the conventional macroscopic SIL. By numerical simulations, tolerance has been confirmed with a slight variation in beam size and geometrical modification to make the model compatible with fabrication errors. This narrow bandwidth intensity distribution can be utilized for scanning the sample with higher resolution, especially in the field of quantum technology.
format Preprint
id arxiv_https___arxiv_org_abs_2602_19417
institution arXiv
publishDate 2026
record_format arxiv
spellingShingle Superresolution technique beyond the diffraction limit under a structured beam via different optical nanostructures
Roy, Subhankar
Hu, Jianping
Momeen, M Ummal
Optics
Quantum Physics
To overcome the limit of diffraction while achieving the superresolution technique, solid immersion lenses are the key optical elements for data storage and nanophotonics applications. Recent demonstrations have shown how different nanostructures (such as elliptical SILs) are used in diverse fields of increasing resolution in the presence of a structured Gaussian beam. By applying twisted beams such as angular momentum beams (Laguerre- Gaussian) and spatial higher-order Gaussian beams (Hermite- Gauss), we can attain a sharp (FWHM = 27 nm) near-field focal spot pattern, which is considerably better than the conventional macroscopic SIL. By numerical simulations, tolerance has been confirmed with a slight variation in beam size and geometrical modification to make the model compatible with fabrication errors. This narrow bandwidth intensity distribution can be utilized for scanning the sample with higher resolution, especially in the field of quantum technology.
title Superresolution technique beyond the diffraction limit under a structured beam via different optical nanostructures
topic Optics
Quantum Physics
url https://arxiv.org/abs/2602.19417