Quantum Simulations for Extreme Ultraviolet Photolithography

Fuente: arXiv

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Bibliographic Details
Main Authors:	Kharazi, Tyler D., Fomichev, Stepan, Kanno, Shu, Kobayashi, Takao, Arrazola, Juan Miguel, Gao, Qi, Stetina, Torin F.
Format:	Preprint
Published:	2026
Subjects:	Quantum Physics
Online Access:	Acceder al recurso
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Internet

https://arxiv.org/abs/2602.20234