High-Stress Si3N4 Reflective Membranes Monolithically Integrated with Cavity Bragg Mirrors
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arXiv
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| Autori principali: | , , , |
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| Natura: | Preprint |
| Pubblicazione: |
2026
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| _version_ | 1866914364774154240 |
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| author | Khokhar, Megha Norder, Lucas Sberna, Paolo M. Norte, Richard A. |
| author_facet | Khokhar, Megha Norder, Lucas Sberna, Paolo M. Norte, Richard A. |
| contents | High-stress silicon nitride (Si3N4) membranes represent the state-of-the-art for cavity optomechanics, combining ultralow dissipation, optical transparency, and full compatibility with wafer-scale nanofabrication. Yet their integration into high-finesse optical cavities has remained difficult, typically requiring bonding or alignment-sensitive assembly that limits scalability and long-term stability. Here, we introduce a monolithic, wafer-level integration strategy that directly suspends high-stress Si3N4 photonic-crystal membranes above thermally compatible SiN/SiO2 distributed Bragg reflectors (DBRs) capable of withstanding the high temperatures required for stoichiometric Si3N4 growth. A defect-free amorphous-silicon sacrificial layer and stiction-free plasma undercut yield vertically coupled cavities with sub-micron spacing-forming self-aligned resonators within seconds of release. Owing to the intrinsic tensile stress, the suspended membranes exhibit atomic-scale sagging, ensuring near-ideal cavity parallelism and long-term stability. Optical reflectivity measurements reveal cavity finesse exceeding 800 with nanoscale gaps between mirrors. Mechanical ringdown measurements show Q > 10^5, indicating that DBR integration preserves the low-dissipation character of high-stress Si3N4. This demonstrates that the integration process preserves the material's exceptional dissipation dilution, supporting straightforward extension to high-Q nanomechanical architectures reported in the literature. The resulting Si3N4-DBR platform unites optical and mechanical coherence with high fabrication yield and design flexibility, enabling scalable optomechanical devices for precision sensing and quantum photonics. |
| format | Preprint |
| id |
arxiv_https___arxiv_org_abs_2603_02490 |
| institution | arXiv |
| publishDate | 2026 |
| record_format | arxiv |
| spellingShingle | High-Stress Si3N4 Reflective Membranes Monolithically Integrated with Cavity Bragg Mirrors Khokhar, Megha Norder, Lucas Sberna, Paolo M. Norte, Richard A. Optics Mesoscale and Nanoscale Physics Materials Science Applied Physics Quantum Physics High-stress silicon nitride (Si3N4) membranes represent the state-of-the-art for cavity optomechanics, combining ultralow dissipation, optical transparency, and full compatibility with wafer-scale nanofabrication. Yet their integration into high-finesse optical cavities has remained difficult, typically requiring bonding or alignment-sensitive assembly that limits scalability and long-term stability. Here, we introduce a monolithic, wafer-level integration strategy that directly suspends high-stress Si3N4 photonic-crystal membranes above thermally compatible SiN/SiO2 distributed Bragg reflectors (DBRs) capable of withstanding the high temperatures required for stoichiometric Si3N4 growth. A defect-free amorphous-silicon sacrificial layer and stiction-free plasma undercut yield vertically coupled cavities with sub-micron spacing-forming self-aligned resonators within seconds of release. Owing to the intrinsic tensile stress, the suspended membranes exhibit atomic-scale sagging, ensuring near-ideal cavity parallelism and long-term stability. Optical reflectivity measurements reveal cavity finesse exceeding 800 with nanoscale gaps between mirrors. Mechanical ringdown measurements show Q > 10^5, indicating that DBR integration preserves the low-dissipation character of high-stress Si3N4. This demonstrates that the integration process preserves the material's exceptional dissipation dilution, supporting straightforward extension to high-Q nanomechanical architectures reported in the literature. The resulting Si3N4-DBR platform unites optical and mechanical coherence with high fabrication yield and design flexibility, enabling scalable optomechanical devices for precision sensing and quantum photonics. |
| title | High-Stress Si3N4 Reflective Membranes Monolithically Integrated with Cavity Bragg Mirrors |
| topic | Optics Mesoscale and Nanoscale Physics Materials Science Applied Physics Quantum Physics |
| url | https://arxiv.org/abs/2603.02490 |