Study on the Effect of Annealing on Ga$_2$O$_3$ Thin Films Deposited on Silicon by RF Sputtering

Fuente: arXiv
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Main Authors: Sousa, Ana Sofia, Esteves, Duarte M., Robalo, Tiago T., Rodrigues, Mário S., Lorenz, Katharina, Peres, Marco
Format: Preprint
Published: 2026
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_version_ 1866918370057650176
author Sousa, Ana Sofia
Esteves, Duarte M.
Robalo, Tiago T.
Rodrigues, Mário S.
Lorenz, Katharina
Peres, Marco
author_facet Sousa, Ana Sofia
Esteves, Duarte M.
Robalo, Tiago T.
Rodrigues, Mário S.
Lorenz, Katharina
Peres, Marco
contents Gallium oxide is an ultra-wide bandgap semiconductor with excellent opto-electronic properties, making it a highly promising material for a wide range of applications and devices. In this article, we report how the optical, morphological, structural, and compositional properties of $β$-Ga$_2$O$_3$ thin films deposited by RF sputtering on silicon substrates are affected by thermal treatments. Ellipsometric spectra recorded at multiple angles of incidence from several samples subjected to thermal annealing in the range of 550-1000 $^\circ$C were analyzed to extract the optical functions using appropriate multilayer models. This analysis is complemented by compositional, structural, and morphological characterization techniques. A significant increase of the refractive index was found after annealing at 1000 $^\circ$C, accompanied by a stark improvement in the samples' crystalline structure, as confirmed by complementary structural and compositional characterization techniques.
format Preprint
id arxiv_https___arxiv_org_abs_2603_04327
institution arXiv
publishDate 2026
record_format arxiv
spellingShingle Study on the Effect of Annealing on Ga$_2$O$_3$ Thin Films Deposited on Silicon by RF Sputtering
Sousa, Ana Sofia
Esteves, Duarte M.
Robalo, Tiago T.
Rodrigues, Mário S.
Lorenz, Katharina
Peres, Marco
Materials Science
Mesoscale and Nanoscale Physics
Gallium oxide is an ultra-wide bandgap semiconductor with excellent opto-electronic properties, making it a highly promising material for a wide range of applications and devices. In this article, we report how the optical, morphological, structural, and compositional properties of $β$-Ga$_2$O$_3$ thin films deposited by RF sputtering on silicon substrates are affected by thermal treatments. Ellipsometric spectra recorded at multiple angles of incidence from several samples subjected to thermal annealing in the range of 550-1000 $^\circ$C were analyzed to extract the optical functions using appropriate multilayer models. This analysis is complemented by compositional, structural, and morphological characterization techniques. A significant increase of the refractive index was found after annealing at 1000 $^\circ$C, accompanied by a stark improvement in the samples' crystalline structure, as confirmed by complementary structural and compositional characterization techniques.
title Study on the Effect of Annealing on Ga$_2$O$_3$ Thin Films Deposited on Silicon by RF Sputtering
topic Materials Science
Mesoscale and Nanoscale Physics
url https://arxiv.org/abs/2603.04327