ALD Oxidant as A Tuning Knob for Memory Window Expansion in Ferroelectric FETs for Vertical NAND Applications

Fuente: arXiv

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Bibliographic Details
Main Authors:	Jeyakumar, Ranie, Venkatesan, Prasanna, Fernandes, Lance, Soliman, Salma, Ravikumar, Priyankka, Song, Taeyoung, Zhang, Chengyang, Hwang, Woohyun, Seo, Kwangyou, Lim, Suhwan, Kim, Wanki, Ha, Daewon, Yu, Shimeng, Datta, Suman, Khan, Asif
Format:	Preprint
Published:	2026
Subjects:	Materials Science
Online Access:	Acceder al recurso
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Internet

https://arxiv.org/abs/2603.10127