Atomic-Scale Mechanisms of SiO$_2$ Plasma-Enhanced Chemical Vapor Deposition Revealed by Molecular Dynamics with a Machine-Learning Interatomic Potential

Fuente: arXiv

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Bibliographic Details
Main Authors:	Kim, Jaehoon, Moon, Minseok, Cho, Hyunsung, Kim, Hyeon-Deuk, Kim, Rokyeon, Park, Gyehyun, Han, Seungwu, Kang, Youngho
Format:	Preprint
Published:	2026
Subjects:	Materials Science
Online Access:	Acceder al recurso
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Internet

https://arxiv.org/abs/2603.11416