Nitrogen-Vacancy-Mediated Magnetism in Sputtered GdN Thin Films

Fuente: arXiv
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Main Authors: Bhardwaj, Pankaj, Sarkar, Jyotirmoy, Biswal, Bubun, Negi, Subhransu Kumar, Sinha, Arijit, Venugopalrao, Anirudh, C, Sharath Kumar, Nair, Sreelakshmi M, Patel, R. S., Nagar, Deepshika Jaiswal, Mishra, Abhishek, Raghavan, Srinivasan, Waghmare, Umesh, Suri, Dhavala
Format: Preprint
Published: 2026
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author Bhardwaj, Pankaj
Sarkar, Jyotirmoy
Biswal, Bubun
Negi, Subhransu Kumar
Sinha, Arijit
Venugopalrao, Anirudh
C, Sharath Kumar
Nair, Sreelakshmi M
Patel, R. S.
Nagar, Deepshika Jaiswal
Mishra, Abhishek
Raghavan, Srinivasan
Waghmare, Umesh
Suri, Dhavala
author_facet Bhardwaj, Pankaj
Sarkar, Jyotirmoy
Biswal, Bubun
Negi, Subhransu Kumar
Sinha, Arijit
Venugopalrao, Anirudh
C, Sharath Kumar
Nair, Sreelakshmi M
Patel, R. S.
Nagar, Deepshika Jaiswal
Mishra, Abhishek
Raghavan, Srinivasan
Waghmare, Umesh
Suri, Dhavala
contents Among rare-earth nitrides (RENs), gadolinium nitride (GdN) stands out as a promising material for spintronics owing to its distinctive combination of semiconducting behavior, strong exchange interactions, and intrinsically soft ferromagnetism. Its relatively high Curie temperature and large saturation magnetization make it an attractive candidate for device concepts such as non-volatile memory elements and spin-based transistors, motivating efforts toward low-cost, uniform, and compositionally controlled thin-film growth. In this work, we deposited GdN thin films on SiO2/AlN substrates using DC sputtering under reactive nitridation conditions, with thicknesses varying from 18 to 180 nm, and systematically investigated their structural and magnetic properties. The films exhibit soft ferromagnetic ordering, characterized by a coercive field of approximately 200 Oe and a Curie temperature (Tc) near 70 K. Structural analysis reveals lattice distortions and local strain associated with nitrogen-vacancy defects, whose concentration varies with film thickness. Our theoretical studies establish a direct correlation between the observed Raman modes of the GdN lattice and the reduced magnetization induced by nitrogen vacancies. These vacancies give rise to defect-mediated ferromagnetism, leading to a measurable enhancement of Tc from 68 K to 82 K across the studied thickness range. The observed magnetic behavior is well described by the bound magnetic polaron (BMP) model, confirming that nitrogen vacancies are key contributors to ferromagnetic ordering while preserving the soft-magnetic character intrinsic to GdN. This study underscores the pivotal role of defect engineering in optimizing GdN thin films for spintronics applications.
format Preprint
id arxiv_https___arxiv_org_abs_2603_13817
institution arXiv
publishDate 2026
record_format arxiv
spellingShingle Nitrogen-Vacancy-Mediated Magnetism in Sputtered GdN Thin Films
Bhardwaj, Pankaj
Sarkar, Jyotirmoy
Biswal, Bubun
Negi, Subhransu Kumar
Sinha, Arijit
Venugopalrao, Anirudh
C, Sharath Kumar
Nair, Sreelakshmi M
Patel, R. S.
Nagar, Deepshika Jaiswal
Mishra, Abhishek
Raghavan, Srinivasan
Waghmare, Umesh
Suri, Dhavala
Materials Science
Among rare-earth nitrides (RENs), gadolinium nitride (GdN) stands out as a promising material for spintronics owing to its distinctive combination of semiconducting behavior, strong exchange interactions, and intrinsically soft ferromagnetism. Its relatively high Curie temperature and large saturation magnetization make it an attractive candidate for device concepts such as non-volatile memory elements and spin-based transistors, motivating efforts toward low-cost, uniform, and compositionally controlled thin-film growth. In this work, we deposited GdN thin films on SiO2/AlN substrates using DC sputtering under reactive nitridation conditions, with thicknesses varying from 18 to 180 nm, and systematically investigated their structural and magnetic properties. The films exhibit soft ferromagnetic ordering, characterized by a coercive field of approximately 200 Oe and a Curie temperature (Tc) near 70 K. Structural analysis reveals lattice distortions and local strain associated with nitrogen-vacancy defects, whose concentration varies with film thickness. Our theoretical studies establish a direct correlation between the observed Raman modes of the GdN lattice and the reduced magnetization induced by nitrogen vacancies. These vacancies give rise to defect-mediated ferromagnetism, leading to a measurable enhancement of Tc from 68 K to 82 K across the studied thickness range. The observed magnetic behavior is well described by the bound magnetic polaron (BMP) model, confirming that nitrogen vacancies are key contributors to ferromagnetic ordering while preserving the soft-magnetic character intrinsic to GdN. This study underscores the pivotal role of defect engineering in optimizing GdN thin films for spintronics applications.
title Nitrogen-Vacancy-Mediated Magnetism in Sputtered GdN Thin Films
topic Materials Science
url https://arxiv.org/abs/2603.13817