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Auteurs principaux: Yamazaki, Yuichi, Kiyoi, Akira, Kawabata, Naoyuki, Watanabe, Yuki, Akashi, Ryosuke, Daimon, Shunsuke, Miyawaki, Nobumasa, Matsushita, Yu-ichiro, Kohda, Makoto, Ohshima, Takeshi
Format: Preprint
Publié: 2026
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Accès en ligne:https://arxiv.org/abs/2603.13836
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author Yamazaki, Yuichi
Kiyoi, Akira
Kawabata, Naoyuki
Watanabe, Yuki
Akashi, Ryosuke
Daimon, Shunsuke
Miyawaki, Nobumasa
Matsushita, Yu-ichiro
Kohda, Makoto
Ohshima, Takeshi
author_facet Yamazaki, Yuichi
Kiyoi, Akira
Kawabata, Naoyuki
Watanabe, Yuki
Akashi, Ryosuke
Daimon, Shunsuke
Miyawaki, Nobumasa
Matsushita, Yu-ichiro
Kohda, Makoto
Ohshima, Takeshi
contents For high-bias operation devices such as silicon carbide (SiC) power devices, early detection of failure mechanisms is essential to ensure reliability. This requires a method to map high electric fields with high spatial resolution, which has not been realized until now. Here we report that the silicon vacancy (Vsi) in SiC has outstanding characteristics for detecting electric fields applied in various directions within a high-biased SiC device. Vsi exhibits an equivalent response to electric field components parallel (Epara) and perpendicular (Eperp) to the c-axis, a feature unique among quantum sensors, and the responsiveness to Epara and Eperp enables detection of arbitrary electric fields encountered in cutting-edge SiC power devices. We confirmed high electric field detection of ~2.3 MV/cm, which is ~90% of the breakdown electric field of a 4H-SiC with typical carrier concentration. Selectively formed Vsi enables high-resolution mapping of electric field distribution. Vsi-based quantum sensors bring data-driven research and development methodologies as well as device degradation diagnosis.
format Preprint
id arxiv_https___arxiv_org_abs_2603_13836
institution arXiv
publishDate 2026
record_format arxiv
spellingShingle Quantum electrometry in a silicon carbide power device
Yamazaki, Yuichi
Kiyoi, Akira
Kawabata, Naoyuki
Watanabe, Yuki
Akashi, Ryosuke
Daimon, Shunsuke
Miyawaki, Nobumasa
Matsushita, Yu-ichiro
Kohda, Makoto
Ohshima, Takeshi
Quantum Physics
For high-bias operation devices such as silicon carbide (SiC) power devices, early detection of failure mechanisms is essential to ensure reliability. This requires a method to map high electric fields with high spatial resolution, which has not been realized until now. Here we report that the silicon vacancy (Vsi) in SiC has outstanding characteristics for detecting electric fields applied in various directions within a high-biased SiC device. Vsi exhibits an equivalent response to electric field components parallel (Epara) and perpendicular (Eperp) to the c-axis, a feature unique among quantum sensors, and the responsiveness to Epara and Eperp enables detection of arbitrary electric fields encountered in cutting-edge SiC power devices. We confirmed high electric field detection of ~2.3 MV/cm, which is ~90% of the breakdown electric field of a 4H-SiC with typical carrier concentration. Selectively formed Vsi enables high-resolution mapping of electric field distribution. Vsi-based quantum sensors bring data-driven research and development methodologies as well as device degradation diagnosis.
title Quantum electrometry in a silicon carbide power device
topic Quantum Physics
url https://arxiv.org/abs/2603.13836