Nanostructuring SiC by sequential plasma oxidation and reactive ion etching

Fuente: arXiv

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Bibliographic Details
Main Authors:	Isometsä, Joonas, Bieleviciute, Auguste, Liu, Xiaolong, Vähänissi, Ville, Savin, Hele
Format:	Preprint
Published:	2026
Subjects:	Applied Physics
Online Access:	Acceder al recurso
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Internet

https://arxiv.org/abs/2603.16589