First Plasma Atomic Layer Etching of Diamond via O$_2$/Kr Chemistry

Fuente: arXiv

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Bibliographic Details
Main Authors:	Tran, Duc Duy, Mannequin, Cedric, Traore, Aboulaye, Sasaki, Masahiro, Gheeraert, Etienne
Format:	Preprint
Published:	2026
Subjects:	Materials Science Applied Physics Plasma Physics
Online Access:	Acceder al recurso
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Internet

https://arxiv.org/abs/2603.21159