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First Plasma Atomic Layer Etching of Diamond via O$_2$/Kr Chemistry

Fuente: arXiv

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Detalles Bibliográficos
Autores principales:	Tran, Duc Duy, Mannequin, Cedric, Traore, Aboulaye, Sasaki, Masahiro, Gheeraert, Etienne
Formato:	Preprint
Publicado:	2026
Materias:	Materials Science Applied Physics Plasma Physics
Acceso en línea:	Acceder al recurso
Etiquetas:	Agregar Etiqueta Sin Etiquetas, Sea el primero en etiquetar este registro!

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