Mie-lithography: self-guiding nonlinear laser printing for deep ultraviolet to near-infrared nano dispersion devices
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| Autores principales: | , , , , , , , , , , , |
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| Formato: | Preprint |
| Publicado: |
2026
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| _version_ | 1866912978798903296 |
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| author | Gong, Wei Li, Zhen-Ze Yu, Chang Wang, Zhen Fan, Han-Yue Wang, Yi Chen, Zhi-Hao Jin, Chun-Qi Lei, Yu-Hao Chen, Qi-Dai Wang, Lei Sun, Hong-Bo |
| author_facet | Gong, Wei Li, Zhen-Ze Yu, Chang Wang, Zhen Fan, Han-Yue Wang, Yi Chen, Zhi-Hao Jin, Chun-Qi Lei, Yu-Hao Chen, Qi-Dai Wang, Lei Sun, Hong-Bo |
| contents | Nanoscale control of optical dispersion is essential for applications ranging from miniaturized spectrometers to color printing, all of which demand broadband spectral tunability. However, the Kramers-Kronig relations impose a fundamental trade-off between dispersion and loss, strictly limiting the design ability of single-material devices across the deep ultraviolet (DUV) to near-infrared (NIR) regimes. Consequently, the fabrication of miniaturized dispersion devices heavily relies on costly nanofabrication or heterogeneous integration. Here we overcome these limitations by shifting the light-matter interaction from solid structure into air-filled voids. We introduce a fabrication strategy termed "Mie-lithography", in which laser printed seed nanocavities excite Mie resonances in air and the resulting localized field enhancement drives the self-assembly of three-dimensionally tunable void-type optical resonators. Because the resonant modes are primarily confined within air voids, this architecture effectively circumvents material-imposed dispersion-loss constraints, allowing on-demand customization of the broadband spectral response. This approach enables single-step, high-throughput (>= 10^6 pixels/s) printing of dispersion units with a resolution of 63,500 DPI. As a proof of concept, we demonstrate a DUV-NIR nano spectrometer integrated in a single material covering an unprecedented range from 200 nm to 800 nm. Our approach can be extended into a platform for ultra-broadband nano devices fabrication and design, opening avenues for high-pixel-density displays and miniaturized spectrometers. |
| format | Preprint |
| id |
arxiv_https___arxiv_org_abs_2603_22034 |
| institution | arXiv |
| publishDate | 2026 |
| record_format | arxiv |
| spellingShingle | Mie-lithography: self-guiding nonlinear laser printing for deep ultraviolet to near-infrared nano dispersion devices Gong, Wei Li, Zhen-Ze Yu, Chang Wang, Zhen Fan, Han-Yue Wang, Yi Chen, Zhi-Hao Jin, Chun-Qi Lei, Yu-Hao Chen, Qi-Dai Wang, Lei Sun, Hong-Bo Optics Nanoscale control of optical dispersion is essential for applications ranging from miniaturized spectrometers to color printing, all of which demand broadband spectral tunability. However, the Kramers-Kronig relations impose a fundamental trade-off between dispersion and loss, strictly limiting the design ability of single-material devices across the deep ultraviolet (DUV) to near-infrared (NIR) regimes. Consequently, the fabrication of miniaturized dispersion devices heavily relies on costly nanofabrication or heterogeneous integration. Here we overcome these limitations by shifting the light-matter interaction from solid structure into air-filled voids. We introduce a fabrication strategy termed "Mie-lithography", in which laser printed seed nanocavities excite Mie resonances in air and the resulting localized field enhancement drives the self-assembly of three-dimensionally tunable void-type optical resonators. Because the resonant modes are primarily confined within air voids, this architecture effectively circumvents material-imposed dispersion-loss constraints, allowing on-demand customization of the broadband spectral response. This approach enables single-step, high-throughput (>= 10^6 pixels/s) printing of dispersion units with a resolution of 63,500 DPI. As a proof of concept, we demonstrate a DUV-NIR nano spectrometer integrated in a single material covering an unprecedented range from 200 nm to 800 nm. Our approach can be extended into a platform for ultra-broadband nano devices fabrication and design, opening avenues for high-pixel-density displays and miniaturized spectrometers. |
| title | Mie-lithography: self-guiding nonlinear laser printing for deep ultraviolet to near-infrared nano dispersion devices |
| topic | Optics |
| url | https://arxiv.org/abs/2603.22034 |