Benchmarking Dual-Polarization Silicon Nitride Photonic Integrated Circuits for Trapped-Ion Quantum Technologies

Fuente: arXiv
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Autori principali: Grimpe, Carl-Frederik, Lüßmann-Sorokina, Anastasiia, Du, Guochun, Sah, Pragya, Sauer, Steffen, Jordan, Elena, Thomas, Rijil, Gehrmann, Pascal, Lipkin, Maksim, Suckow, Stephan, Lemme, Max C., Kroker, Stefanie, Mehlstäubler, Tanja E.
Natura: Preprint
Pubblicazione: 2026
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author Grimpe, Carl-Frederik
Lüßmann-Sorokina, Anastasiia
Du, Guochun
Sah, Pragya
Sauer, Steffen
Jordan, Elena
Thomas, Rijil
Gehrmann, Pascal
Lipkin, Maksim
Suckow, Stephan
Lemme, Max C.
Kroker, Stefanie
Mehlstäubler, Tanja E.
author_facet Grimpe, Carl-Frederik
Lüßmann-Sorokina, Anastasiia
Du, Guochun
Sah, Pragya
Sauer, Steffen
Jordan, Elena
Thomas, Rijil
Gehrmann, Pascal
Lipkin, Maksim
Suckow, Stephan
Lemme, Max C.
Kroker, Stefanie
Mehlstäubler, Tanja E.
contents Trapped ions are one of the most advanced platforms for quantum technologies, with applications ranging from quantum computing to precision timekeeping. A crucial step towards more compact and scalable systems involves integrating photonic integrated circuits (PICs) into surface ion traps to enable on-chip light delivery and optical addressing of individual ions. Currently, most implementations rely solely on transverse-electric (TE) mode grating couplers, where the emitted light is polarized in the plane of the chip. In this work, we design, fabricate and characterize silicon nitride (Si\(_3\)N\(_4\)) PIC components, including incoupling structures, splitters, and grating couplers that support both TE and transverse-magnetic (TM) modes with comparable optical losses. We benchmark the PIC at 760\,nm, which is a typical wavelength for Yb$^{+}$-applications. The fabricated grating couplers enable the outcoupling of collimated free-space beams for both polarizations, exhibiting distinct emission angles. This dual-polarization capability gives more flexibility in polarization control and expands the accessible optical design space for trapped-ion quantum technologies.
format Preprint
id arxiv_https___arxiv_org_abs_2603_22578
institution arXiv
publishDate 2026
record_format arxiv
spellingShingle Benchmarking Dual-Polarization Silicon Nitride Photonic Integrated Circuits for Trapped-Ion Quantum Technologies
Grimpe, Carl-Frederik
Lüßmann-Sorokina, Anastasiia
Du, Guochun
Sah, Pragya
Sauer, Steffen
Jordan, Elena
Thomas, Rijil
Gehrmann, Pascal
Lipkin, Maksim
Suckow, Stephan
Lemme, Max C.
Kroker, Stefanie
Mehlstäubler, Tanja E.
Optics
Trapped ions are one of the most advanced platforms for quantum technologies, with applications ranging from quantum computing to precision timekeeping. A crucial step towards more compact and scalable systems involves integrating photonic integrated circuits (PICs) into surface ion traps to enable on-chip light delivery and optical addressing of individual ions. Currently, most implementations rely solely on transverse-electric (TE) mode grating couplers, where the emitted light is polarized in the plane of the chip. In this work, we design, fabricate and characterize silicon nitride (Si\(_3\)N\(_4\)) PIC components, including incoupling structures, splitters, and grating couplers that support both TE and transverse-magnetic (TM) modes with comparable optical losses. We benchmark the PIC at 760\,nm, which is a typical wavelength for Yb$^{+}$-applications. The fabricated grating couplers enable the outcoupling of collimated free-space beams for both polarizations, exhibiting distinct emission angles. This dual-polarization capability gives more flexibility in polarization control and expands the accessible optical design space for trapped-ion quantum technologies.
title Benchmarking Dual-Polarization Silicon Nitride Photonic Integrated Circuits for Trapped-Ion Quantum Technologies
topic Optics
url https://arxiv.org/abs/2603.22578