Kim, H., Lee, M., Jeon, S. H., & Lee, K. S. (2026). Wafer-Level Etch Spatial Profiling for Process Monitoring from Time-Series with Time-LLM.
Citazione stile Chigago Style (17a edizione)Kim, Hyunwoo, Munyoung Lee, Seung Hyub Jeon, e Kyu Sung Lee. Wafer-Level Etch Spatial Profiling for Process Monitoring from Time-Series with Time-LLM. 2026.
Citatione MLA (9a ed.)Kim, Hyunwoo, et al. Wafer-Level Etch Spatial Profiling for Process Monitoring from Time-Series with Time-LLM. 2026.
Attenzione: Queste citazioni potrebbero non essere precise al 100%.