First-principles high-throughput screening of ruthenium compounds for advanced interconnects

Fuente: arXiv

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Bibliographic Details
Main Authors:	Maeng, Gyungho, Lim, Subeen, Shong, Bonggeun, Lee, Yeonghun
Format:	Preprint
Published:	2026
Subjects:	Materials Science
Online Access:	Acceder al recurso
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Internet

https://arxiv.org/abs/2603.24194