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Bibliographic Details
Main Authors: Schneider, Fabian, Wölfel, Christian
Format: Preprint
Published: 2026
Subjects:
Online Access:https://arxiv.org/abs/2603.25602
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author Schneider, Fabian
Wölfel, Christian
author_facet Schneider, Fabian
Wölfel, Christian
contents Reactive sputtering is a plasma-based technique to deposit a thin film on a substrate. This contribution presents a novel parameter-interval estimation method for a well-established model that describes the uncertain and nonlinear reactive sputtering process behaviour. Building on a proposed monotonicity-based model classification, the method guarantees that all parameterizations within the parameter interval yield output trajectories and static characteristics consistent with the enclosure induced by the parameter interval. Correctness and practical applicability of the new method are demonstrated by an experimental validation, which also reveals inherent structural limitations of the well-established process model for state-estimation tasks.
format Preprint
id arxiv_https___arxiv_org_abs_2603_25602
institution arXiv
publishDate 2026
record_format arxiv
spellingShingle Parameter-interval estimation for cooperative reactive sputtering processes
Schneider, Fabian
Wölfel, Christian
Systems and Control
Reactive sputtering is a plasma-based technique to deposit a thin film on a substrate. This contribution presents a novel parameter-interval estimation method for a well-established model that describes the uncertain and nonlinear reactive sputtering process behaviour. Building on a proposed monotonicity-based model classification, the method guarantees that all parameterizations within the parameter interval yield output trajectories and static characteristics consistent with the enclosure induced by the parameter interval. Correctness and practical applicability of the new method are demonstrated by an experimental validation, which also reveals inherent structural limitations of the well-established process model for state-estimation tasks.
title Parameter-interval estimation for cooperative reactive sputtering processes
topic Systems and Control
url https://arxiv.org/abs/2603.25602