Plasmon Engineering in Intercalated 2H-TaS$_2$
Fuente:
arXiv
Enregistré dans:
| Auteurs principaux: | , , , , , , , , , , |
|---|---|
| Format: | Preprint |
| Publié: |
2026
|
| Sujets: | |
| Accès en ligne: | |
| Tags: |
Ajouter un tag
Pas de tags, Soyez le premier à ajouter un tag!
|
| _version_ | 1866912990685560832 |
|---|---|
| author | Camerano, Luigi Martella, Laura Battaglia, Lorenzo Giannessi, Federico Camilli, Filippo Lozzi, Luca Sheverdyaeva, Polina M. Moras, Paolo Ottaviano, Luca Profeta, Gianni Bisti, Federico |
| author_facet | Camerano, Luigi Martella, Laura Battaglia, Lorenzo Giannessi, Federico Camilli, Filippo Lozzi, Luca Sheverdyaeva, Polina M. Moras, Paolo Ottaviano, Luca Profeta, Gianni Bisti, Federico |
| contents | Plasmons in low dimensional materials provide a powerful platform for nanoscale control of light matter interactions, yet strategies to tailor their coherence and dissipation remain limited. Here, we demonstrate that transition metal intercalation offers a fundamentally distinct route to engineer plasmonic response in layered materials. By combining high-resolution core-level photoemission spectroscopy with first-principles calculations, we show that Fe and Co intercalation in 2H-TaS2 does not act as conventional electron doping, but instead reshapes the low energy electronic structure through orbital hybridization and structural reconstruction. This process introduces a dense continuum of low energy excitations that efficiently damp and ultimately suppress the plasmon mode. First principle calculations of the energy loss function reveal a transition from a well defined collective excitation to an overdamped response, signaling the breakdown of coherent charge dynamics. Our results establish intercalation as a chemically controlled pathway to tune plasmon losses and dielectric response in quantum van der Waals materials, providing a new design principle for plasmonic and optoelectronic functionalities at the nanoscale. |
| format | Preprint |
| id |
arxiv_https___arxiv_org_abs_2603_29402 |
| institution | arXiv |
| publishDate | 2026 |
| record_format | arxiv |
| spellingShingle | Plasmon Engineering in Intercalated 2H-TaS$_2$ Camerano, Luigi Martella, Laura Battaglia, Lorenzo Giannessi, Federico Camilli, Filippo Lozzi, Luca Sheverdyaeva, Polina M. Moras, Paolo Ottaviano, Luca Profeta, Gianni Bisti, Federico Materials Science Strongly Correlated Electrons Plasmons in low dimensional materials provide a powerful platform for nanoscale control of light matter interactions, yet strategies to tailor their coherence and dissipation remain limited. Here, we demonstrate that transition metal intercalation offers a fundamentally distinct route to engineer plasmonic response in layered materials. By combining high-resolution core-level photoemission spectroscopy with first-principles calculations, we show that Fe and Co intercalation in 2H-TaS2 does not act as conventional electron doping, but instead reshapes the low energy electronic structure through orbital hybridization and structural reconstruction. This process introduces a dense continuum of low energy excitations that efficiently damp and ultimately suppress the plasmon mode. First principle calculations of the energy loss function reveal a transition from a well defined collective excitation to an overdamped response, signaling the breakdown of coherent charge dynamics. Our results establish intercalation as a chemically controlled pathway to tune plasmon losses and dielectric response in quantum van der Waals materials, providing a new design principle for plasmonic and optoelectronic functionalities at the nanoscale. |
| title | Plasmon Engineering in Intercalated 2H-TaS$_2$ |
| topic | Materials Science Strongly Correlated Electrons |
| url | https://arxiv.org/abs/2603.29402 |