Inverse Design of Optical Multilayer Thin Films using Robust Masked Diffusion Models

Fuente: arXiv
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Main Authors: Schaible, Jonas, Özdemir, Asena Karolin, Debus, Charlotte, Burger, Sven, Streit, Achim, Becker, Christiane, Jäger, Klaus, Götz, Markus
Format: Preprint
Published: 2026
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_version_ 1866908931429761024
author Schaible, Jonas
Özdemir, Asena Karolin
Debus, Charlotte
Burger, Sven
Streit, Achim
Becker, Christiane
Jäger, Klaus
Götz, Markus
author_facet Schaible, Jonas
Özdemir, Asena Karolin
Debus, Charlotte
Burger, Sven
Streit, Achim
Becker, Christiane
Jäger, Klaus
Götz, Markus
contents Inverse design of optical multilayer stacks seeks to infer layer materials, thicknesses, and ordering from a desired target spectrum. It is a long-standing challenge due to the large design space and non-unique solutions. We introduce \texttt{OptoLlama}, a masked diffusion language model for inverse thin-film design from optical spectra. Representing multilayer stacks as sequences of material-thickness tokens, \texttt{OptoLlama} conditions generation on reflectance, absorptance, and transmittance spectra and learns a probabilistic mapping from optical response to structure. Evaluated on a representative test set of 3,000 targets, \texttt{OptoLlama} reduces the mean absolute spectral error by 2.9-fold relative to a nearest-neighbor template baseline and by 3.45-fold relative to the state-of-the-art data-driven baseline, called \texttt{OptoGPT}. Case studies on designed and expert-defined targets show that the model reproduces characteristic spectral features and recovers physically meaningful stack motifs, including distributed Bragg reflectors. These results establish diffusion-based sequence modeling as a powerful framework for inverse photonic design.
format Preprint
id arxiv_https___arxiv_org_abs_2604_01106
institution arXiv
publishDate 2026
record_format arxiv
spellingShingle Inverse Design of Optical Multilayer Thin Films using Robust Masked Diffusion Models
Schaible, Jonas
Özdemir, Asena Karolin
Debus, Charlotte
Burger, Sven
Streit, Achim
Becker, Christiane
Jäger, Klaus
Götz, Markus
Optics
Machine Learning
Inverse design of optical multilayer stacks seeks to infer layer materials, thicknesses, and ordering from a desired target spectrum. It is a long-standing challenge due to the large design space and non-unique solutions. We introduce \texttt{OptoLlama}, a masked diffusion language model for inverse thin-film design from optical spectra. Representing multilayer stacks as sequences of material-thickness tokens, \texttt{OptoLlama} conditions generation on reflectance, absorptance, and transmittance spectra and learns a probabilistic mapping from optical response to structure. Evaluated on a representative test set of 3,000 targets, \texttt{OptoLlama} reduces the mean absolute spectral error by 2.9-fold relative to a nearest-neighbor template baseline and by 3.45-fold relative to the state-of-the-art data-driven baseline, called \texttt{OptoGPT}. Case studies on designed and expert-defined targets show that the model reproduces characteristic spectral features and recovers physically meaningful stack motifs, including distributed Bragg reflectors. These results establish diffusion-based sequence modeling as a powerful framework for inverse photonic design.
title Inverse Design of Optical Multilayer Thin Films using Robust Masked Diffusion Models
topic Optics
Machine Learning
url https://arxiv.org/abs/2604.01106