K., N., Koch, M. C., Fujisawa, K., Dey, A., & S, S. (2026). 2.5-D Electrical Resistivity Forward Modelling with Undulating Topography using a Modified Half-Space Analytical Solution.
Cita Chicago Style (17a ed.)K., Naveen, Michael C. Koch, Kazunori Fujisawa, Arindam Dey, y Sreedeep S. 2.5-D Electrical Resistivity Forward Modelling with Undulating Topography Using a Modified Half-Space Analytical Solution. 2026.
Cita MLA (9a ed.)K., Naveen, et al. 2.5-D Electrical Resistivity Forward Modelling with Undulating Topography Using a Modified Half-Space Analytical Solution. 2026.
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