Temperature Dependent Characteristics of Quasi-vertical AlN Schottky Diodes on Bulk AlN Substrate
Fuente:
arXiv
Saved in:
| Main Authors: | , , , , , |
|---|---|
| Format: | Preprint |
| Published: |
2026
|
| Subjects: | |
| Online Access: | |
| Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
| _version_ | 1866910107260944384 |
|---|---|
| author | Hamid, Md Abdul Das, Nabasindhu Gilankar, Advait Lenzen, Brad Smith, David J. Kalarickal, Nidhin Kurian |
| author_facet | Hamid, Md Abdul Das, Nabasindhu Gilankar, Advait Lenzen, Brad Smith, David J. Kalarickal, Nidhin Kurian |
| contents | We report on the fabrication and temperature-dependent characterization of MOCVD-grown quasi-vertical AlN Schottky barrier diodes (SBDs) on bulk AlN substrates. The SBDs exhibited high current densities exceeding 2 kA/cm2 at 10 V, with a turn-on voltage of ~3.0 V (at 1 A/cm^2) and an on/off ratio >10^9 at room temperature. Stable rectifying operation was maintained up to 300 C (the highest measured temperature), with a pronounced increase in current density at elevated temperatures due to thermally activated carrier transport, accompanied by an increase in extracted Schottky barrier height and a reduction in ideality factor. Capacitance voltage measurements showed strong temperature dependence due to the deep donor nature of Si in AlN, resulting in an increase in the net donor concentration (ND-NA) from ~5x10^17 cm-3 at 300 K to ~1x10^18 cm-3 at 373 K. Temperature-dependent reverse-bias characteristics were consistent with Poole-Frenkel emission as the dominant leakage mechanism, with an estimated trap energy of ~0.34 eV. Characterization using transmission electron microscopy and energy-dispersive X-ray spectroscopy revealed a ~5 nm AlNxOy interfacial layer at the metal/semiconductor junction, which likely influences both forward and reverse transport. These results provide insight into carrier transport, leakage mechanisms, interface chemistry, and high-temperature characteristics, and guidance for the future development of high-performance AlN power devices. |
| format | Preprint |
| id |
arxiv_https___arxiv_org_abs_2604_05106 |
| institution | arXiv |
| publishDate | 2026 |
| record_format | arxiv |
| spellingShingle | Temperature Dependent Characteristics of Quasi-vertical AlN Schottky Diodes on Bulk AlN Substrate Hamid, Md Abdul Das, Nabasindhu Gilankar, Advait Lenzen, Brad Smith, David J. Kalarickal, Nidhin Kurian Applied Physics Materials Science We report on the fabrication and temperature-dependent characterization of MOCVD-grown quasi-vertical AlN Schottky barrier diodes (SBDs) on bulk AlN substrates. The SBDs exhibited high current densities exceeding 2 kA/cm2 at 10 V, with a turn-on voltage of ~3.0 V (at 1 A/cm^2) and an on/off ratio >10^9 at room temperature. Stable rectifying operation was maintained up to 300 C (the highest measured temperature), with a pronounced increase in current density at elevated temperatures due to thermally activated carrier transport, accompanied by an increase in extracted Schottky barrier height and a reduction in ideality factor. Capacitance voltage measurements showed strong temperature dependence due to the deep donor nature of Si in AlN, resulting in an increase in the net donor concentration (ND-NA) from ~5x10^17 cm-3 at 300 K to ~1x10^18 cm-3 at 373 K. Temperature-dependent reverse-bias characteristics were consistent with Poole-Frenkel emission as the dominant leakage mechanism, with an estimated trap energy of ~0.34 eV. Characterization using transmission electron microscopy and energy-dispersive X-ray spectroscopy revealed a ~5 nm AlNxOy interfacial layer at the metal/semiconductor junction, which likely influences both forward and reverse transport. These results provide insight into carrier transport, leakage mechanisms, interface chemistry, and high-temperature characteristics, and guidance for the future development of high-performance AlN power devices. |
| title | Temperature Dependent Characteristics of Quasi-vertical AlN Schottky Diodes on Bulk AlN Substrate |
| topic | Applied Physics Materials Science |
| url | https://arxiv.org/abs/2604.05106 |