Machine learning Hamiltonian enables scalable and accurate defect calculations: The case of oxygen vacancies in amorphous SiO$_2$

Fuente: arXiv

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Bibliographic Details
Main Authors:	Dai, Zhenxing, Yang, Zhong, Ni, Mingjue, Huang, Menglin, Xiang, Hongjun, Gong, Xin-Gao, Chen, Shiyou
Format:	Preprint
Published:	2026
Subjects:	Materials Science
Online Access:	Acceder al recurso
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Internet

https://arxiv.org/abs/2604.07197