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Machine learning Hamiltonian enables scalable and accurate defect calculations: The case of oxygen vacancies in amorphous SiO$_2$

Fuente: arXiv

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Detalles Bibliográficos
Autores principales:	Dai, Zhenxing, Yang, Zhong, Ni, Mingjue, Huang, Menglin, Xiang, Hongjun, Gong, Xin-Gao, Chen, Shiyou
Formato:	Preprint
Publicado:	2026
Materias:	Materials Science
Acceso en línea:	Acceder al recurso
Etiquetas:	Agregar Etiqueta Sin Etiquetas, Sea el primero en etiquetar este registro!

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