Competing thermalization pathways of photoexcited hot electrons

Fuente: arXiv

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Bibliographic Details
Main Authors:	Seibel, Christopher, Held, Tobias, Uehlein, Markus, Rethfeld, Baerbel
Format:	Preprint
Published:	2026
Subjects:	Materials Science
Online Access:	Acceder al recurso
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Internet

https://arxiv.org/abs/2604.09236