Multilayer Laue Lenses for Enhanced Spatial Resolution in Dark-Field X-ray Microscopy
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arXiv
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| Autori principali: | , , , , , , , |
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| Natura: | Preprint |
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2026
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| author | Staeck, Steffen Yildirim, Can Rodriguez-Lamas, Raquel Dufrane, Thomas Detlefs, Carsten Gellert, Nis Padula, Antonella Gayoso Poulsen, Henning Friis |
| author_facet | Staeck, Steffen Yildirim, Can Rodriguez-Lamas, Raquel Dufrane, Thomas Detlefs, Carsten Gellert, Nis Padula, Antonella Gayoso Poulsen, Henning Friis |
| contents | We introduce the use of a crossed pair of Multilayer Laue Lenses (MLLs) as an objective in Dark-Field X-ray Microscopy (DFXM). In a demonstration experiment at the ID03 beamline at ESRF, two flat Mo-Si MLLs were used, with a physical aperture of 50 x 50 $\mathrm{μm^2}$ and a focal length of 14.25 mm at 19 keV. Applying a 10 % criterion to the Modulation Transfer Functions (MTFs) acquired, a spatial resolution of 56 nm is obtained in bright-field mode -- more than three times better than with a compound refractive lens (CRL) objective. The dark-field resolution is similar. With an efficiency of 26.7 % the MLL objective expands the science domain of DFXM significantly, both for bulk and near-surface studies. Similar to the CRL case, the reciprocal space resolution is dominated by the numerical aperture (NA) of the objective, with the NA being three times larger in the MLL case. This enables faster orientation mapping and implies improved options for the use of tomographic reconstruction algorithms. Although the MLL objective pupil varies with energy and position, secondary peaks are suppressed, simplifying both interpretation and forward simulations. We present an example DFXM application using the MLL as an objective, imaging a through-silicon via Kelvin device. |
| format | Preprint |
| id |
arxiv_https___arxiv_org_abs_2604_20309 |
| institution | arXiv |
| publishDate | 2026 |
| record_format | arxiv |
| spellingShingle | Multilayer Laue Lenses for Enhanced Spatial Resolution in Dark-Field X-ray Microscopy Staeck, Steffen Yildirim, Can Rodriguez-Lamas, Raquel Dufrane, Thomas Detlefs, Carsten Gellert, Nis Padula, Antonella Gayoso Poulsen, Henning Friis Materials Science We introduce the use of a crossed pair of Multilayer Laue Lenses (MLLs) as an objective in Dark-Field X-ray Microscopy (DFXM). In a demonstration experiment at the ID03 beamline at ESRF, two flat Mo-Si MLLs were used, with a physical aperture of 50 x 50 $\mathrm{μm^2}$ and a focal length of 14.25 mm at 19 keV. Applying a 10 % criterion to the Modulation Transfer Functions (MTFs) acquired, a spatial resolution of 56 nm is obtained in bright-field mode -- more than three times better than with a compound refractive lens (CRL) objective. The dark-field resolution is similar. With an efficiency of 26.7 % the MLL objective expands the science domain of DFXM significantly, both for bulk and near-surface studies. Similar to the CRL case, the reciprocal space resolution is dominated by the numerical aperture (NA) of the objective, with the NA being three times larger in the MLL case. This enables faster orientation mapping and implies improved options for the use of tomographic reconstruction algorithms. Although the MLL objective pupil varies with energy and position, secondary peaks are suppressed, simplifying both interpretation and forward simulations. We present an example DFXM application using the MLL as an objective, imaging a through-silicon via Kelvin device. |
| title | Multilayer Laue Lenses for Enhanced Spatial Resolution in Dark-Field X-ray Microscopy |
| topic | Materials Science |
| url | https://arxiv.org/abs/2604.20309 |