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Hauptverfasser: Lin, Baichen, Chen, Shanquan, Zhang, Yubo, Si, Yangyang, Huang, Haoliang, Huo, Chuanrui, Munnik, Frans, Dong, Yongqi, You, Lu, Shao, Jian, Ku, Yu-Chieh, Quyen, Nguyen Nhat, Keshri, Aryan, Luo, Zhenlin, Zhao, Weiwei, Chang, Chun-Fu, Luo, Chih-Wei, Das, Sujit, Deng, Shiqing, Kuo, Chang-Yang, Chen, Zuhuang
Format: Preprint
Veröffentlicht: 2026
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Online-Zugang:https://arxiv.org/abs/2604.24240
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author Lin, Baichen
Chen, Shanquan
Zhang, Yubo
Si, Yangyang
Huang, Haoliang
Huo, Chuanrui
Munnik, Frans
Dong, Yongqi
You, Lu
Shao, Jian
Ku, Yu-Chieh
Quyen, Nguyen Nhat
Keshri, Aryan
Luo, Zhenlin
Zhao, Weiwei
Chang, Chun-Fu
Luo, Chih-Wei
Das, Sujit
Deng, Shiqing
Kuo, Chang-Yang
Chen, Zuhuang
author_facet Lin, Baichen
Chen, Shanquan
Zhang, Yubo
Si, Yangyang
Huang, Haoliang
Huo, Chuanrui
Munnik, Frans
Dong, Yongqi
You, Lu
Shao, Jian
Ku, Yu-Chieh
Quyen, Nguyen Nhat
Keshri, Aryan
Luo, Zhenlin
Zhao, Weiwei
Chang, Chun-Fu
Luo, Chih-Wei
Das, Sujit
Deng, Shiqing
Kuo, Chang-Yang
Chen, Zuhuang
contents Metal-insulator transitions (MITs) in correlated oxides offer immense potential for next-generation Mottronic devices. However, their integration into practical applications is often hindered by the coupling of MITs with symmetry-lowering structural phase transitions, which limits switching speed and endurance. In this study, we engineered an iso-symmetric MIT on average in epitaxial rutile VO2 thin films via an in-situ nitrogen doping strategy. Nitrogen incorporation effectively suppresses V-V dimerization, enabling an iso-symmetric MIT, while preserving the original crystal symmetry. Furthermore, in-operando time-resolved optical reflectivity measurements revealed a shortened switching time in nitrogen-doped films, highlighting their enhanced performance. Our findings provide critical insights into the underlying mechanisms of MITs and introduce anion doping as a powerful tool for tailoring phase transitions in strongly correlated electron systems. This approach opens new avenues for the development of high-performance electronic and photonic devices.
format Preprint
id arxiv_https___arxiv_org_abs_2604_24240
institution arXiv
publishDate 2026
record_format arxiv
spellingShingle Nitrogen doping induced metal-insulator transition with iso-symmetric character in rutile VO2
Lin, Baichen
Chen, Shanquan
Zhang, Yubo
Si, Yangyang
Huang, Haoliang
Huo, Chuanrui
Munnik, Frans
Dong, Yongqi
You, Lu
Shao, Jian
Ku, Yu-Chieh
Quyen, Nguyen Nhat
Keshri, Aryan
Luo, Zhenlin
Zhao, Weiwei
Chang, Chun-Fu
Luo, Chih-Wei
Das, Sujit
Deng, Shiqing
Kuo, Chang-Yang
Chen, Zuhuang
Materials Science
Metal-insulator transitions (MITs) in correlated oxides offer immense potential for next-generation Mottronic devices. However, their integration into practical applications is often hindered by the coupling of MITs with symmetry-lowering structural phase transitions, which limits switching speed and endurance. In this study, we engineered an iso-symmetric MIT on average in epitaxial rutile VO2 thin films via an in-situ nitrogen doping strategy. Nitrogen incorporation effectively suppresses V-V dimerization, enabling an iso-symmetric MIT, while preserving the original crystal symmetry. Furthermore, in-operando time-resolved optical reflectivity measurements revealed a shortened switching time in nitrogen-doped films, highlighting their enhanced performance. Our findings provide critical insights into the underlying mechanisms of MITs and introduce anion doping as a powerful tool for tailoring phase transitions in strongly correlated electron systems. This approach opens new avenues for the development of high-performance electronic and photonic devices.
title Nitrogen doping induced metal-insulator transition with iso-symmetric character in rutile VO2
topic Materials Science
url https://arxiv.org/abs/2604.24240