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| Main Authors: | , , |
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| Format: | Preprint |
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2026
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| Subjects: | |
| Online Access: | https://arxiv.org/abs/2604.26987 |
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| _version_ | 1866917448217788416 |
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| author | Martin, Rémi Duluard, Sandrine Merlet, Céline |
| author_facet | Martin, Rémi Duluard, Sandrine Merlet, Céline |
| contents | Electrophoretic deposition is a method of choice for generating coatings thanks to its ease of implementation and its ability to produce coatings of relatively large thicknesses in a single step process. While this process also benefits from a large number of tunable parameters to adapt the coating to each application (applied electric field, particle concentration, viscosity of the suspension, etc...), such a freedom can lead to the selection of parameters being an overwhelming task. A better fundamental understanding of the microscopic phenomena and mechanisms at play during deposition can provide clues for the more efficient design of optimized coatings. Particle-based models, allowing for the simulation of deposit microstructures for various process parameters, are particularly interesting to get insights in such systems. Nevertheless, such studies are rare and usually do not involve the possibility of self-cohesion between particles, while it seems crucial for the final structure of the deposit. Here, we use particle-based simulations to study the influence of aggregation on the deposit formed for different applied electric fields. We show that the self-cohesion indeed leads to different microstructures, both in the close vicinity of the substrate and in the bulk of the deposit, and relate this to the mechanical signature of the deposits. Our results reveal that at high electric field, the influence of self-cohesion on resulting microstructures essentially vanishes beyond a critical field strength. This marks the transition between a deposition regime affected by aggregation to a regime largely dominated by volume exclusion effects. |
| format | Preprint |
| id |
arxiv_https___arxiv_org_abs_2604_26987 |
| institution | arXiv |
| publishDate | 2026 |
| record_format | arxiv |
| spellingShingle | The effect of Van der Waals interaction on the microstructure of EPD deposits: a simulation study Martin, Rémi Duluard, Sandrine Merlet, Céline Materials Science Electrophoretic deposition is a method of choice for generating coatings thanks to its ease of implementation and its ability to produce coatings of relatively large thicknesses in a single step process. While this process also benefits from a large number of tunable parameters to adapt the coating to each application (applied electric field, particle concentration, viscosity of the suspension, etc...), such a freedom can lead to the selection of parameters being an overwhelming task. A better fundamental understanding of the microscopic phenomena and mechanisms at play during deposition can provide clues for the more efficient design of optimized coatings. Particle-based models, allowing for the simulation of deposit microstructures for various process parameters, are particularly interesting to get insights in such systems. Nevertheless, such studies are rare and usually do not involve the possibility of self-cohesion between particles, while it seems crucial for the final structure of the deposit. Here, we use particle-based simulations to study the influence of aggregation on the deposit formed for different applied electric fields. We show that the self-cohesion indeed leads to different microstructures, both in the close vicinity of the substrate and in the bulk of the deposit, and relate this to the mechanical signature of the deposits. Our results reveal that at high electric field, the influence of self-cohesion on resulting microstructures essentially vanishes beyond a critical field strength. This marks the transition between a deposition regime affected by aggregation to a regime largely dominated by volume exclusion effects. |
| title | The effect of Van der Waals interaction on the microstructure of EPD deposits: a simulation study |
| topic | Materials Science |
| url | https://arxiv.org/abs/2604.26987 |