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| Format: | Preprint |
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2026
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| Online-Zugang: | https://arxiv.org/abs/2605.09843 |
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| _version_ | 1866910207549898752 |
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| author | Laudert, Benjamin Abtahi, Fatemeh Vavreckova, Sarka Schmitt, Sebastian W. Eilenberger, Falk |
| author_facet | Laudert, Benjamin Abtahi, Fatemeh Vavreckova, Sarka Schmitt, Sebastian W. Eilenberger, Falk |
| contents | We present a non-destructive, spatially resolved thickness characterization method for rhombohedral (3R) molybdenum disulfide (MoS$_2$) on polydimethylsiloxane (PDMS) substrates. Unlike broadband spectroscopic approaches, the proposed method reduces the measurement to a small number of discrete intensity images, enabling direct thickness mapping with a conventional microscope architecture and commercially available bandpass filters. Our approach combines a systematic framework for selecting optimal discrete wavelength samples of the material's reflectance with a robust thickness retrieval algorithm based on a multivariate Gaussian probability model. By sampling the reflectance with just five strategically chosen near-infrared bandpass filters, we demonstrate thickness characterization up to 691 nm with a mean 95% confidence-interval width of 8.3 nm. The method is adaptable to other van der Waals materials and conventional optical thin-film systems. It therefore provides a foundation for scalable, real-time thickness characterization in, e.g., dry-transfer fabrication workflows, where thickness screening remains a critical bottleneck for the production of van der Waals heterostructure devices. |
| format | Preprint |
| id |
arxiv_https___arxiv_org_abs_2605_09843 |
| institution | arXiv |
| publishDate | 2026 |
| record_format | arxiv |
| spellingShingle | Sparse Spectral Imaging for Thickness Mapping of 3R-MoS$_2$ on PDMS Laudert, Benjamin Abtahi, Fatemeh Vavreckova, Sarka Schmitt, Sebastian W. Eilenberger, Falk Optics Data Analysis, Statistics and Probability We present a non-destructive, spatially resolved thickness characterization method for rhombohedral (3R) molybdenum disulfide (MoS$_2$) on polydimethylsiloxane (PDMS) substrates. Unlike broadband spectroscopic approaches, the proposed method reduces the measurement to a small number of discrete intensity images, enabling direct thickness mapping with a conventional microscope architecture and commercially available bandpass filters. Our approach combines a systematic framework for selecting optimal discrete wavelength samples of the material's reflectance with a robust thickness retrieval algorithm based on a multivariate Gaussian probability model. By sampling the reflectance with just five strategically chosen near-infrared bandpass filters, we demonstrate thickness characterization up to 691 nm with a mean 95% confidence-interval width of 8.3 nm. The method is adaptable to other van der Waals materials and conventional optical thin-film systems. It therefore provides a foundation for scalable, real-time thickness characterization in, e.g., dry-transfer fabrication workflows, where thickness screening remains a critical bottleneck for the production of van der Waals heterostructure devices. |
| title | Sparse Spectral Imaging for Thickness Mapping of 3R-MoS$_2$ on PDMS |
| topic | Optics Data Analysis, Statistics and Probability |
| url | https://arxiv.org/abs/2605.09843 |