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Main Authors: Ma, Kuo, Zhang, De, He, Shengjia, Wang, Tian-ao, Li, Han, Nie, Yu, Wang, Xiuxia, Peng, Jinlan, Liang, Zheng, Li, Xiang, Shi, Wenhua, Liu, Manwen, Liao, Chuan, Li, Zheng, Tang, Zebo, Liu, Yanwen
Format: Preprint
Published: 2026
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Online Access:https://arxiv.org/abs/2605.13281
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author Ma, Kuo
Zhang, De
He, Shengjia
Wang, Tian-ao
Li, Han
Nie, Yu
Wang, Xiuxia
Peng, Jinlan
Liang, Zheng
Li, Xiang
Shi, Wenhua
Liu, Manwen
Liao, Chuan
Li, Zheng
Tang, Zebo
Liu, Yanwen
author_facet Ma, Kuo
Zhang, De
He, Shengjia
Wang, Tian-ao
Li, Han
Nie, Yu
Wang, Xiuxia
Peng, Jinlan
Liang, Zheng
Li, Xiang
Shi, Wenhua
Liu, Manwen
Liao, Chuan
Li, Zheng
Tang, Zebo
Liu, Yanwen
contents We report on the development of 3D silicon sensors at the University of Science and Technology of China (USTC). The sensor involves columnar electrodes (5 um in diameter) of both doping types, etched from the same wafer side. The p+ electrodes pass through the epitaxial wafer, whereas the n+ electrodes stop at a short distance from the opposite side of the epitaxial wafer. With respect to previous generations of 3D sensors, they feature an ultra-thin active substrate (50 um) and a small pixel size of 50 um x 50 um or 25 um x 25 um. This R&D project aims to establish a sensor technology to simultaneously measure position and time information at the single-pixel level. The first run with one merged wafer layout has been completed. The design, fabrication, and characterization of the sensors are reported in this paper.
format Preprint
id arxiv_https___arxiv_org_abs_2605_13281
institution arXiv
publishDate 2026
record_format arxiv
spellingShingle Development of Small-pitch, Ultra-thin 3D Silicon Sensors at USTC
Ma, Kuo
Zhang, De
He, Shengjia
Wang, Tian-ao
Li, Han
Nie, Yu
Wang, Xiuxia
Peng, Jinlan
Liang, Zheng
Li, Xiang
Shi, Wenhua
Liu, Manwen
Liao, Chuan
Li, Zheng
Tang, Zebo
Liu, Yanwen
Instrumentation and Detectors
We report on the development of 3D silicon sensors at the University of Science and Technology of China (USTC). The sensor involves columnar electrodes (5 um in diameter) of both doping types, etched from the same wafer side. The p+ electrodes pass through the epitaxial wafer, whereas the n+ electrodes stop at a short distance from the opposite side of the epitaxial wafer. With respect to previous generations of 3D sensors, they feature an ultra-thin active substrate (50 um) and a small pixel size of 50 um x 50 um or 25 um x 25 um. This R&D project aims to establish a sensor technology to simultaneously measure position and time information at the single-pixel level. The first run with one merged wafer layout has been completed. The design, fabrication, and characterization of the sensors are reported in this paper.
title Development of Small-pitch, Ultra-thin 3D Silicon Sensors at USTC
topic Instrumentation and Detectors
url https://arxiv.org/abs/2605.13281