Photolithography-Only Fabrication of Transmons Using Double-Oblique Evaporation
Fuente:
arXiv
Guardado en:
| Autores principales: | Aoyanagi, K., Abe, S., Chen, S., Inada, T., Kawai, C., Mino, Y., Nakamura, K., Nakazono, K., Nitta, T., Watanabe, K. |
|---|---|
| Formato: | Preprint |
| Publicado: |
2026
|
| Materias: | |
| Acceso en línea: | |
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