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| Main Authors: | , , , , , |
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| Format: | Preprint |
| Published: |
2026
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| Subjects: | |
| Online Access: | https://arxiv.org/abs/2605.20406 |
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| _version_ | 1866911699909476352 |
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| author | Samanta, Chandan Palmese, Elia Ouyang, Ziyu Zhama, Tuofu Pino, Robinson Zeng, Yuping |
| author_facet | Samanta, Chandan Palmese, Elia Ouyang, Ziyu Zhama, Tuofu Pino, Robinson Zeng, Yuping |
| contents | TiO2 ferroelectric field effect transistors (FeFETs) with HfZrO2 (HZO) ferroelectric dielectric layers and bottom gate topology are fabricated for applications in neuromorphic systems. Two sets of devices are fabricated with different gate topologies by varying the thickness of the ferroelectric gate stack. Different device architectures are studied by varying the source drain length (LSD) and gate length (LG). The devices have high on/off ratios up to 10^7 with low leakage off currents <10^-12 A. Repeated cycle testing shows high reliability and a stable memory window. The devices have large memory windows ranging from 3 to 8 V. |
| format | Preprint |
| id |
arxiv_https___arxiv_org_abs_2605_20406 |
| institution | arXiv |
| publishDate | 2026 |
| record_format | arxiv |
| spellingShingle | High Performance TiO2 Ferroelectric Field Effect Transistors with HfZrO2 for Neuromorphic Computing Samanta, Chandan Palmese, Elia Ouyang, Ziyu Zhama, Tuofu Pino, Robinson Zeng, Yuping Applied Physics TiO2 ferroelectric field effect transistors (FeFETs) with HfZrO2 (HZO) ferroelectric dielectric layers and bottom gate topology are fabricated for applications in neuromorphic systems. Two sets of devices are fabricated with different gate topologies by varying the thickness of the ferroelectric gate stack. Different device architectures are studied by varying the source drain length (LSD) and gate length (LG). The devices have high on/off ratios up to 10^7 with low leakage off currents <10^-12 A. Repeated cycle testing shows high reliability and a stable memory window. The devices have large memory windows ranging from 3 to 8 V. |
| title | High Performance TiO2 Ferroelectric Field Effect Transistors with HfZrO2 for Neuromorphic Computing |
| topic | Applied Physics |
| url | https://arxiv.org/abs/2605.20406 |