Garment Particles: A 2D--3D Symmetric Garment Representation for Generation and Editing
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arXiv
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| Main Authors: | , , , , , |
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| Format: | Preprint |
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2026
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| _version_ | 1866917537743110144 |
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| author | Nakayama, Kiyohiro Shen, I-Chao Liu, Ruofan Wang, Yiming Wetzstein, Gordon Igarashi, Takeo |
| author_facet | Nakayama, Kiyohiro Shen, I-Chao Liu, Ruofan Wang, Yiming Wetzstein, Gordon Igarashi, Takeo |
| contents | Practical garment design spans two modes: intuitive creation from high-level intent, such as a reference image or text description, and complex low-level editing across 2D sewing patterns and 3D draped geometry, which requires professional training to navigate their complex interdependencies. Yet existing frameworks address only part of this challenge, offering either garment generation from casual inputs or direct editing on sewing patterns. To support both ends of the spectrum, we propose Garment Particles, a 5D point-cloud representation that jointly encodes 2D sewing patterns and 3D geometry. This representation enables Garment Particles Flow (GPF), a rectified flow framework that supports intuitive generation from high-level inputs (text, images, sketches) and various editing operations on 2D sewing patterns and 3D geometries via diffusion posterior sampling. Finally, we introduce Particles-to-Pattern Flow that converts generated garment particles into curved-based patterns for simulation. We validate our model's generation ability on multiple datasets, achieving state-of-the-art garment generation results against competitive baselines. Our model also enables many garment editing scenarios, including garment interpolation, sewing pattern editing, point-cloud- and silhouette-conditioned garment generation. Our project website is at https://garment-particles.github.io . |
| format | Preprint |
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arxiv_https___arxiv_org_abs_2605_26391 |
| institution | arXiv |
| publishDate | 2026 |
| record_format | arxiv |
| spellingShingle | Garment Particles: A 2D--3D Symmetric Garment Representation for Generation and Editing Nakayama, Kiyohiro Shen, I-Chao Liu, Ruofan Wang, Yiming Wetzstein, Gordon Igarashi, Takeo Graphics Computer Vision and Pattern Recognition Practical garment design spans two modes: intuitive creation from high-level intent, such as a reference image or text description, and complex low-level editing across 2D sewing patterns and 3D draped geometry, which requires professional training to navigate their complex interdependencies. Yet existing frameworks address only part of this challenge, offering either garment generation from casual inputs or direct editing on sewing patterns. To support both ends of the spectrum, we propose Garment Particles, a 5D point-cloud representation that jointly encodes 2D sewing patterns and 3D geometry. This representation enables Garment Particles Flow (GPF), a rectified flow framework that supports intuitive generation from high-level inputs (text, images, sketches) and various editing operations on 2D sewing patterns and 3D geometries via diffusion posterior sampling. Finally, we introduce Particles-to-Pattern Flow that converts generated garment particles into curved-based patterns for simulation. We validate our model's generation ability on multiple datasets, achieving state-of-the-art garment generation results against competitive baselines. Our model also enables many garment editing scenarios, including garment interpolation, sewing pattern editing, point-cloud- and silhouette-conditioned garment generation. Our project website is at https://garment-particles.github.io . |
| title | Garment Particles: A 2D--3D Symmetric Garment Representation for Generation and Editing |
| topic | Graphics Computer Vision and Pattern Recognition |
| url | https://arxiv.org/abs/2605.26391 |