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| Main Authors: | , , , , , , , , , , , , , |
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| Format: | Preprint |
| Published: |
2026
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| Subjects: | |
| Online Access: | https://arxiv.org/abs/2605.28765 |
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| _version_ | 1866914621384818688 |
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| author | Nenezic, Patrick Vissers, Ewoud Moerman, Arno Bogaert, Laurens Billet, Maximilien Zheng, Xiujun Vanackere, Tom Niels, Margot Papadopoulou, Athina Uvin, Sarah De Heyn, Peter Saseendran, Sandeep Atzeni, Simone Kuyken, Bart |
| author_facet | Nenezic, Patrick Vissers, Ewoud Moerman, Arno Bogaert, Laurens Billet, Maximilien Zheng, Xiujun Vanackere, Tom Niels, Margot Papadopoulou, Athina Uvin, Sarah De Heyn, Peter Saseendran, Sandeep Atzeni, Simone Kuyken, Bart |
| contents | We present a variability-aware simulation framework for heterogeneously integrated lithium niobate traveling-wave modulators. The framework incorporates fabrication-variation data obtained from our dedicated pilot line and enables efficient optimisation of geometric parameters to ensure stable device performance across wafer-scale manufacturing. The proposed multi-parameter optimisation method enables the efficient identification of modulator designs that simultaneously achieve target performance metrics (Vpi, optical insertion loss, and 3dB electro-optic bandwidth) while maintaining robustness against fabrication-induced variations. Using this methodology on two representative modulator architectures, we theoretically demonstrate that reliable wafer-scale integration of lithium niobate modulators on silicon photonics via micro-transfer printing is feasible and can be systematically engineered. |
| format | Preprint |
| id |
arxiv_https___arxiv_org_abs_2605_28765 |
| institution | arXiv |
| publishDate | 2026 |
| record_format | arxiv |
| spellingShingle | A variability-aware simulation and design workflow for wafer-scale, heterogeneously integrated lithium niobate modulators Nenezic, Patrick Vissers, Ewoud Moerman, Arno Bogaert, Laurens Billet, Maximilien Zheng, Xiujun Vanackere, Tom Niels, Margot Papadopoulou, Athina Uvin, Sarah De Heyn, Peter Saseendran, Sandeep Atzeni, Simone Kuyken, Bart Optics We present a variability-aware simulation framework for heterogeneously integrated lithium niobate traveling-wave modulators. The framework incorporates fabrication-variation data obtained from our dedicated pilot line and enables efficient optimisation of geometric parameters to ensure stable device performance across wafer-scale manufacturing. The proposed multi-parameter optimisation method enables the efficient identification of modulator designs that simultaneously achieve target performance metrics (Vpi, optical insertion loss, and 3dB electro-optic bandwidth) while maintaining robustness against fabrication-induced variations. Using this methodology on two representative modulator architectures, we theoretically demonstrate that reliable wafer-scale integration of lithium niobate modulators on silicon photonics via micro-transfer printing is feasible and can be systematically engineered. |
| title | A variability-aware simulation and design workflow for wafer-scale, heterogeneously integrated lithium niobate modulators |
| topic | Optics |
| url | https://arxiv.org/abs/2605.28765 |