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Main Authors: Sha, Xuanzhe, Liao, Shun, Li, Xiaoxi, Li, Chengyuan, Liu, Jianli, Pan, Yu, Wang, Wenhai, Ye, Yu, Zhao, Chengxin, Li, Liyi, Wang, Hanwen, Han, Zheng Vitto, Lu, Jianming
Format: Preprint
Published: 2026
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Online Access:https://arxiv.org/abs/2605.31206
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author Sha, Xuanzhe
Liao, Shun
Li, Xiaoxi
Li, Chengyuan
Liu, Jianli
Pan, Yu
Wang, Wenhai
Ye, Yu
Zhao, Chengxin
Li, Liyi
Wang, Hanwen
Han, Zheng Vitto
Lu, Jianming
author_facet Sha, Xuanzhe
Liao, Shun
Li, Xiaoxi
Li, Chengyuan
Liu, Jianli
Pan, Yu
Wang, Wenhai
Ye, Yu
Zhao, Chengxin
Li, Liyi
Wang, Hanwen
Han, Zheng Vitto
Lu, Jianming
contents Radiation-hardened electronics using semiconductors beyond silicon are essential for computation and control in extreme environments. Yet complex digital circuits based on such material platforms operating in situ under heavy-ion irradiation remain largely unexplored. Here, we show a timing circuit based on amorphous thin-film semiconductors at the 100-transistor scale, and demonstrate its robust operation through a functional "Hello World" ASCII output sequence. Beyond static device characterization, we evaluate the circuit under powered heavy-ion irradiation using tantalum ions, providing an operationally relevant assessment of radiation tolerance at the system level. Under a high particle flux of 2.5 x 10^3 ions cm^-2 s^-1, the circuit maintains stable operation during the irradiation test, achieving a total fluence of 1 x 10^6 ions cm^-2, establishing a milestone of prolonged powered digital operation under extreme conditions. Our work expands the design space of radiation-tolerant electronics, highlighting amorphous semiconductors as a promising foundation for digital circuits deployed in harsh environments.
format Preprint
id arxiv_https___arxiv_org_abs_2605_31206
institution arXiv
publishDate 2026
record_format arxiv
spellingShingle In-situ operation of amorphous circuits under heavy-ion irradiation
Sha, Xuanzhe
Liao, Shun
Li, Xiaoxi
Li, Chengyuan
Liu, Jianli
Pan, Yu
Wang, Wenhai
Ye, Yu
Zhao, Chengxin
Li, Liyi
Wang, Hanwen
Han, Zheng Vitto
Lu, Jianming
Materials Science
Other Condensed Matter
Radiation-hardened electronics using semiconductors beyond silicon are essential for computation and control in extreme environments. Yet complex digital circuits based on such material platforms operating in situ under heavy-ion irradiation remain largely unexplored. Here, we show a timing circuit based on amorphous thin-film semiconductors at the 100-transistor scale, and demonstrate its robust operation through a functional "Hello World" ASCII output sequence. Beyond static device characterization, we evaluate the circuit under powered heavy-ion irradiation using tantalum ions, providing an operationally relevant assessment of radiation tolerance at the system level. Under a high particle flux of 2.5 x 10^3 ions cm^-2 s^-1, the circuit maintains stable operation during the irradiation test, achieving a total fluence of 1 x 10^6 ions cm^-2, establishing a milestone of prolonged powered digital operation under extreme conditions. Our work expands the design space of radiation-tolerant electronics, highlighting amorphous semiconductors as a promising foundation for digital circuits deployed in harsh environments.
title In-situ operation of amorphous circuits under heavy-ion irradiation
topic Materials Science
Other Condensed Matter
url https://arxiv.org/abs/2605.31206