Catalytic precursor dissociation in Hot-Wire CVD and comparing a-Si:H growth under continuous and pulsed silane flow conditions

Fuente: arXiv

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Bibliographic Details
Main Authors:	Goyal, Swati, Singh, Karam Veer, Dusane, Rajiv O., Muneshwar, Triratna P.
Format:	Preprint
Published:	2026
Subjects:	Materials Science
Online Access:	Acceder al recurso
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Internet

https://arxiv.org/abs/2606.00788