Matta, J. d. (2003). Description and Characterization of a ECR Plasma Device Developed for Thin Film Deposition. Sociedade Brasileira de Física.
Cita Chicago Style (17a ed.)Matta, J.A.S. da. Description and Characterization of a ECR Plasma Device Developed for Thin Film Deposition. Sociedade Brasileira de Física, 2003.
Cita MLA (9a ed.)Matta, J.A.S. da. Description and Characterization of a ECR Plasma Device Developed for Thin Film Deposition. Sociedade Brasileira de Física, 2003.
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