Toku, H. (2010). Influence of process parameters on the growth of pure-phase anatase and rutile TiO2 thin films deposited by low temperature reactive magnetron sputtering. Sociedade Brasileira de Física.
Chicago Style (17th ed.) CitationToku, H. Influence of Process Parameters on the Growth of Pure-phase Anatase and Rutile TiO2 Thin Films Deposited by Low Temperature Reactive Magnetron Sputtering. Sociedade Brasileira de Física, 2010.
MLA (9th ed.) CitationToku, H. Influence of Process Parameters on the Growth of Pure-phase Anatase and Rutile TiO2 Thin Films Deposited by Low Temperature Reactive Magnetron Sputtering. Sociedade Brasileira de Física, 2010.
Warning: These citations may not always be 100% accurate.