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Influence of process parameters on the growth of pure-phase anatase and rutile TiO2 thin films deposited by low temperature reactive magnetron sputtering

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Bibliographic Details
Main Author:	H. Toku
Format:	Artículo científico
Language:	en
Published:	Sociedade Brasileira de Física 2010
Subjects:	Física, Astronomía y Matemáticas ray diffraction titanium dioxide magnetron sputtering Atomic force microscopy
Online Access:	Acceder al recurso
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