Solid State Reaction of Ruthenium with 6H-SiC Under Vacuum Annealing and the Impact on the Electrical Performance of its Schottky Contact for High Temperature Operating SiC-Based Diodes

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Auteur principal: Kinnock V. Munthali
Format: Artículo científico
Langue:en
Publié: Sociedade Brasileira de Física 2014
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author Kinnock V. Munthali
author_facet Kinnock V. Munthali
contents Solid State Reaction of Ruthenium with 6H-SiC Under Vacuum Annealing and the Impact on the Electrical Performance of its Schottky Contact for High Temperature Operating SiC-Based Diodes Kinnock V. Munthali Chris Theron F. Danie Auret Sergio M. M. Coelho Linda Prinsloo Eric Njoroge Física, Astronomía y Matemáticas 6H SiC Graphite Ruthenium Rutheniumsilicide Thin films and Schottky diodes dots of ruthenium (Ru) on bulk-grown n-type-6-hexagonal-silicon carbide (6HSiC) were annealed isochronally in a vacuum furnace at temperatures ranging from 500–1,000 °C. Rutherford backscattering spectroscopy analysis of the thin films showed formation of ruthenium silicide (Ru2Si3) at 800 °C, while diffusion of Ru into 6H-SiC commenced at 800 °C. Raman analysis of the thin films annealed at 1,000 °C showed clear D and G carbon peaks which was evidence of formation of graphite. At this annealing temperature, the Schottky contact was observed to convert to an ohmic contact, as evidenced by the linearity of current–voltage characteristic, thereby, rendering the diode unusable. The transformation from Schottky contact to ohmic contact is attributed to graphite formation at the interface. 2014 artículo científico 0103-9733 https://www.redalyc.org/articulo.oa?id=46432477019 en http://www.redalyc.org/revista.oa?id=464 Brazilian Journal of Physics application/pdf Sociedade Brasileira de Física Brazilian Journal of Physics (Brasil) Num.6 Vol.44
format Artículo científico
id redalyc_46432477019
institution Redalyc
language en
publishDate 2014
publisher Sociedade Brasileira de Física
spellingShingle Solid State Reaction of Ruthenium with 6H-SiC Under Vacuum Annealing and the Impact on the Electrical Performance of its Schottky Contact for High Temperature Operating SiC-Based Diodes
Kinnock V. Munthali
Física, Astronomía y Matemáticas
6H
SiC
Graphite
Ruthenium
Rutheniumsilicide
Solid State Reaction of Ruthenium with 6H-SiC Under Vacuum Annealing and the Impact on the Electrical Performance of its Schottky Contact for High Temperature Operating SiC-Based Diodes Kinnock V. Munthali Chris Theron F. Danie Auret Sergio M. M. Coelho Linda Prinsloo Eric Njoroge Física, Astronomía y Matemáticas 6H SiC Graphite Ruthenium Rutheniumsilicide Thin films and Schottky diodes dots of ruthenium (Ru) on bulk-grown n-type-6-hexagonal-silicon carbide (6HSiC) were annealed isochronally in a vacuum furnace at temperatures ranging from 500–1,000 °C. Rutherford backscattering spectroscopy analysis of the thin films showed formation of ruthenium silicide (Ru2Si3) at 800 °C, while diffusion of Ru into 6H-SiC commenced at 800 °C. Raman analysis of the thin films annealed at 1,000 °C showed clear D and G carbon peaks which was evidence of formation of graphite. At this annealing temperature, the Schottky contact was observed to convert to an ohmic contact, as evidenced by the linearity of current–voltage characteristic, thereby, rendering the diode unusable. The transformation from Schottky contact to ohmic contact is attributed to graphite formation at the interface. 2014 artículo científico 0103-9733 https://www.redalyc.org/articulo.oa?id=46432477019 en http://www.redalyc.org/revista.oa?id=464 Brazilian Journal of Physics application/pdf Sociedade Brasileira de Física Brazilian Journal of Physics (Brasil) Num.6 Vol.44
title Solid State Reaction of Ruthenium with 6H-SiC Under Vacuum Annealing and the Impact on the Electrical Performance of its Schottky Contact for High Temperature Operating SiC-Based Diodes
topic Física, Astronomía y Matemáticas
6H
SiC
Graphite
Ruthenium
Rutheniumsilicide
url https://www.redalyc.org/articulo.oa?id=46432477019