Riascos, H. (2004). Plasma characterization of pulsed-laser ablation process used for fullerene-like CNx thin film deposition. Sociedade Brasileira de Física.
Chicago Style (17th ed.) CitationRiascos, H. Plasma Characterization of Pulsed-laser Ablation Process Used for Fullerene-like CNx Thin Film Deposition. Sociedade Brasileira de Física, 2004.
MLA (9th ed.) CitationRiascos, H. Plasma Characterization of Pulsed-laser Ablation Process Used for Fullerene-like CNx Thin Film Deposition. Sociedade Brasileira de Física, 2004.
Warning: These citations may not always be 100% accurate.