Riascos, H. (2004). Plasma characterization of pulsed-laser ablation process used for fullerene-like CNx thin film deposition. Sociedade Brasileira de Física.
Chicago-Zitierstil (17. Ausg.)Riascos, H. Plasma Characterization of Pulsed-laser Ablation Process Used for Fullerene-like CNx Thin Film Deposition. Sociedade Brasileira de Física, 2004.
MLA-Zitierstil (9. Ausg.)Riascos, H. Plasma Characterization of Pulsed-laser Ablation Process Used for Fullerene-like CNx Thin Film Deposition. Sociedade Brasileira de Física, 2004.
Achtung: Diese Zitate sind unter Umständen nicht zu 100% korrekt.