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Plasma characterization of pulsed-laser ablation process used for fullerene-like CNx thin film deposition

Fuente: Redalyc

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Detalles Bibliográficos
Autor principal:	H. Riascos
Formato:	Artículo científico
Lenguaje:	en
Publicado:	Sociedade Brasileira de Física 2004
Materias:	Física, Astronomía y Matemáticas
Acceso en línea:	Acceder al recurso
Etiquetas:	Agregar Etiqueta Sin Etiquetas, Sea el primero en etiquetar este registro!

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