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| Format: | Artículo científico |
| Langue: | en |
| Publié: |
Sociedade Brasileira de Física
2006
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| Accès en ligne: | https://www.redalyc.org/articulo.oa?id=46436321 |
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Table des matières:
- Numerical Simulation of HFCVD Process Used for Diamond Growth Divani C. Barbosa Hélcio F. V. Nova Mauricio R. Baldan Física, Astronomía y Matemáticas Hot Diamond growth Numerical simulation filament chemical vapour deposition Hot-filament chemical vapour deposition (HFCVD) is a common method employed for diamond deposition.Typically in this method a dilute mixture of carbon containing gas such as methane in hydrogen is thermallyactivated at sub atmospheric pressures by a hot filament. Due to the filament-substrate proximity, large temperaturevariation across the substrate is possible. In this work we investigate the role of fluid flow and heattransfer from the filament to substrate in determining the quality of diamond growth. The commercial softwareCFX was used to calculate velocity field, temperature distribution and fluid flow. A vortex was identified on thesubstrate. 2006 artículo científico 0103-9733 https://www.redalyc.org/articulo.oa?id=46436321 en http://www.redalyc.org/revista.oa?id=464 Brazilian Journal of Physics application/pdf Sociedade Brasileira de Física Brazilian Journal of Physics (Brasil) Num.2A Vol.36