Hollow Cathode Magnetron Deposition of AlN thin Films: Crystalline Structure and Morphology
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| Format: | Artículo científico |
| Sprache: | en |
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Sociedade Brasileira de Física
2006
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| _version_ | 1876454704192421888 |
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| author | I. C. Oliveira |
| author_facet | I. C. Oliveira |
| contents | Hollow Cathode Magnetron Deposition of AlN thin Films: Crystalline Structure and Morphology I. C. Oliveira K. G. Grigorov R. S. Pessoa G. Murakami G. Petraconi H. S. Maciel Física, Astronomía y Matemáticas XRD amd AFM AlN thin films Hollow cathode magnetron deposition A new dc hollow cathode plasma source has been assembled whith a conventional planar magnetron cathodeused together with another plane cathode plate to form a hollow cathode cavity. The system comprises twocathode plates of aluminium separated by a distance d, one of them acting as target of the magnetron cathode,the other being an ordinary plate. The discharge anode is a metallic flange of the vacuum chamber. Thisleads to enhanced ionization in the cathode cavity region and enables the discharge to operate at significantlylower pressures than for a typical planar magnetron configuration. As a consequence, sputtered atoms canreach a substrate with minimum energy loss due to collisions with filling gas atoms. The discharge gas wasa mixture of argon and nitrogen. AlN thin films were grown on silicon substrates, at ambient temperature,and characterized with respect to the structure and morphology by XRD and AFM analyses respectively. Thestructure and roughness of the AlN films were studied as a function of the deposition parameters. 2006 artículo científico 0103-9733 https://www.redalyc.org/articulo.oa?id=46436326 en http://www.redalyc.org/revista.oa?id=464 Brazilian Journal of Physics application/pdf Sociedade Brasileira de Física Brazilian Journal of Physics (Brasil) Num.2A Vol.36 |
| format | Artículo científico |
| id | redalyc_46436326 |
| institution | Redalyc |
| language | en |
| publishDate | 2006 |
| publisher | Sociedade Brasileira de Física |
| spellingShingle | Hollow Cathode Magnetron Deposition of AlN thin Films: Crystalline Structure and Morphology I. C. Oliveira Física, Astronomía y Matemáticas XRD amd AFM AlN thin films Hollow cathode magnetron deposition Hollow Cathode Magnetron Deposition of AlN thin Films: Crystalline Structure and Morphology I. C. Oliveira K. G. Grigorov R. S. Pessoa G. Murakami G. Petraconi H. S. Maciel Física, Astronomía y Matemáticas XRD amd AFM AlN thin films Hollow cathode magnetron deposition A new dc hollow cathode plasma source has been assembled whith a conventional planar magnetron cathodeused together with another plane cathode plate to form a hollow cathode cavity. The system comprises twocathode plates of aluminium separated by a distance d, one of them acting as target of the magnetron cathode,the other being an ordinary plate. The discharge anode is a metallic flange of the vacuum chamber. Thisleads to enhanced ionization in the cathode cavity region and enables the discharge to operate at significantlylower pressures than for a typical planar magnetron configuration. As a consequence, sputtered atoms canreach a substrate with minimum energy loss due to collisions with filling gas atoms. The discharge gas wasa mixture of argon and nitrogen. AlN thin films were grown on silicon substrates, at ambient temperature,and characterized with respect to the structure and morphology by XRD and AFM analyses respectively. Thestructure and roughness of the AlN films were studied as a function of the deposition parameters. 2006 artículo científico 0103-9733 https://www.redalyc.org/articulo.oa?id=46436326 en http://www.redalyc.org/revista.oa?id=464 Brazilian Journal of Physics application/pdf Sociedade Brasileira de Física Brazilian Journal of Physics (Brasil) Num.2A Vol.36 |
| title | Hollow Cathode Magnetron Deposition of AlN thin Films: Crystalline Structure and Morphology |
| topic | Física, Astronomía y Matemáticas XRD amd AFM AlN thin films Hollow cathode magnetron deposition |
| url | https://www.redalyc.org/articulo.oa?id=46436326 |