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Morphological Study of Polycrystalline SiGe Alloy Deposited by Vertical LPCVD

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Bibliographic Details
Main Author:	R. C. Teixeira
Format:	Artículo científico
Language:	en
Published:	Sociedade Brasileira de Física 2006
Subjects:	Física, Astronomía y Matemáticas Morphological study Polycrystalline SiGe alloy Low Pressure Chemical Vapor Deposition
Online Access:	Acceder al recurso
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