Influence of the Substrate Bias Voltage on the Crystallographic Structure and Surface Composition of Ti6A14V Thin Films Deposited by rf Magnetron Sputtering

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Main Author:	J. F. Marco
Format:	Artículo científico
Language:	en
Published:	Sociedade Brasileira de Física 2006
Subjects:	Física, Astronomía y Matemáticas Bias Steel Sputtering
Online Access:	Acceder al recurso
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author	J. F. Marco
author_facet	J. F. Marco
contents	Influence of the Substrate Bias Voltage on the Crystallographic Structure and Surface Composition of Ti6A14V Thin Films Deposited by rf Magnetron Sputtering J. F. Marco J. E. Alfonso J. Torres Física, Astronomía y Matemáticas Bias Steel Sputtering Ti6Al4V thin films prepared by rf magnetron sputtering were studied. Samples were grown onto two differenttypes of substrates: AISI 420 steel and common glass using a Ti6Al4V (99.9 %) target. Substrate biaswas varied from 100V to 200 V. Samples were characterized by X-ray diffraction (XRD), Energy DispersiveX-ray Analysis (EDX), Scanning Electron Microscopy (SEM), and X-Ray Photoelectron Spectroscopy (XPS).It was observed that the increase of the substrate voltage improved the crystallinity of the deposited films. Thestoichiometry of the deposited thin films was studied by EDX and found to be slightly different from that ofthe target material. Finally, the passive film spontaneously formed on the deposited films upon exposure tothe laboratory atmosphere was studied by XPS. The composition of the passive film is rather complex since itcontains several forms of oxidized titanium and vanadium as well as Al2O3. 2006 artículo científico 0103-9733 https://www.redalyc.org/articulo.oa?id=46436552 en http://www.redalyc.org/revista.oa?id=464 Brazilian Journal of Physics application/pdf Sociedade Brasileira de Física Brazilian Journal of Physics (Brasil) Num.3B Vol.36
format	Artículo científico
id	redalyc_46436552
language	en
publishDate	2006
publisher	Sociedade Brasileira de Física
spellingShingle	Influence of the Substrate Bias Voltage on the Crystallographic Structure and Surface Composition of Ti6A14V Thin Films Deposited by rf Magnetron Sputtering J. F. Marco Física, Astronomía y Matemáticas Bias Steel Sputtering Influence of the Substrate Bias Voltage on the Crystallographic Structure and Surface Composition of Ti6A14V Thin Films Deposited by rf Magnetron Sputtering J. F. Marco J. E. Alfonso J. Torres Física, Astronomía y Matemáticas Bias Steel Sputtering Ti6Al4V thin films prepared by rf magnetron sputtering were studied. Samples were grown onto two differenttypes of substrates: AISI 420 steel and common glass using a Ti6Al4V (99.9 %) target. Substrate biaswas varied from 100V to 200 V. Samples were characterized by X-ray diffraction (XRD), Energy DispersiveX-ray Analysis (EDX), Scanning Electron Microscopy (SEM), and X-Ray Photoelectron Spectroscopy (XPS).It was observed that the increase of the substrate voltage improved the crystallinity of the deposited films. Thestoichiometry of the deposited thin films was studied by EDX and found to be slightly different from that ofthe target material. Finally, the passive film spontaneously formed on the deposited films upon exposure tothe laboratory atmosphere was studied by XPS. The composition of the passive film is rather complex since itcontains several forms of oxidized titanium and vanadium as well as Al2O3. 2006 artículo científico 0103-9733 https://www.redalyc.org/articulo.oa?id=46436552 en http://www.redalyc.org/revista.oa?id=464 Brazilian Journal of Physics application/pdf Sociedade Brasileira de Física Brazilian Journal of Physics (Brasil) Num.3B Vol.36
title	Influence of the Substrate Bias Voltage on the Crystallographic Structure and Surface Composition of Ti6A14V Thin Films Deposited by rf Magnetron Sputtering
topic	Física, Astronomía y Matemáticas Bias Steel Sputtering
url	https://www.redalyc.org/articulo.oa?id=46436552

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