Effect of Process Temperature and Reaction Cycle Number on Atomic Layer Deposition of TiO2 Thin Films Using TiCl4 and H2O Precursors: Correlation Between Material Properties and Process Environment

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Bibliographic Details
Main Author:	W. Chiappim
Format:	Artículo científico
Language:	en
Published:	Sociedade Brasileira de Física 2016
Subjects:	Física, Astronomía y Matemáticas RBS Morphology Mass spectrometry Film crystallinity Titanium tetrachloride
Online Access:	Acceder al recurso
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