On the thickness measurement of metallic thin films
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| Format: | Artículo científico |
| Language: | en |
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Universidad Autónoma de Yucatán
2006
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| _version_ | 1876445547314806784 |
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| author | A. I. Oliva |
| author_facet | A. I. Oliva |
| contents | On the thickness measurement of metallic thin films A. I. Oliva F. López-Garduza V. Sosa Computación film thickness metallic thin films electrical resistance Thickness is a key factor on the physical properties of the new miniaturized technology of thin film devices. Thinfilm physical properties depend on the thickness value and its control. This paper highlights the importance of theaccurate determination of the thickness in thin films. Many efforts have been made through the years to developreliable thickness measurement techniques. In this work, some of these techniques implemented to measure thethickness are briefly discussed. A theoretical model for film thickness determination was discussed. We proposed asimple method based on the variations of electrical resistance of a probe film to measure and control in situ themetallic film thickness with good resolution. Gold films were deposited by free evaporation and sputtering in orderto apply the proposed method to measure and control the film thickness. 2006 artículo científico 1665-529X https://www.redalyc.org/articulo.oa?id=46710206 en http://www.redalyc.org/revista.oa?id=467 Ingeniería application/pdf Universidad Autónoma de Yucatán Ingeniería (México) Num.2 Vol.10 |
| format | Artículo científico |
| id | redalyc_46710206 |
| institution | Redalyc |
| language | en |
| publishDate | 2006 |
| publisher | Universidad Autónoma de Yucatán |
| spellingShingle | On the thickness measurement of metallic thin films A. I. Oliva Computación film thickness metallic thin films electrical resistance On the thickness measurement of metallic thin films A. I. Oliva F. López-Garduza V. Sosa Computación film thickness metallic thin films electrical resistance Thickness is a key factor on the physical properties of the new miniaturized technology of thin film devices. Thinfilm physical properties depend on the thickness value and its control. This paper highlights the importance of theaccurate determination of the thickness in thin films. Many efforts have been made through the years to developreliable thickness measurement techniques. In this work, some of these techniques implemented to measure thethickness are briefly discussed. A theoretical model for film thickness determination was discussed. We proposed asimple method based on the variations of electrical resistance of a probe film to measure and control in situ themetallic film thickness with good resolution. Gold films were deposited by free evaporation and sputtering in orderto apply the proposed method to measure and control the film thickness. 2006 artículo científico 1665-529X https://www.redalyc.org/articulo.oa?id=46710206 en http://www.redalyc.org/revista.oa?id=467 Ingeniería application/pdf Universidad Autónoma de Yucatán Ingeniería (México) Num.2 Vol.10 |
| title | On the thickness measurement of metallic thin films |
| topic | Computación film thickness metallic thin films electrical resistance |
| url | https://www.redalyc.org/articulo.oa?id=46710206 |