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  • Sequential microcontroller-based control for a chemical vapor deposition process
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Sequential microcontroller-based control for a chemical vapor deposition process

Fuente: Redalyc
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Bibliographic Details
Main Author: Edgar Serrano Pérez
Format: Artículo científico
Language:en
Published: Universidad Nacional Autónoma de México 2017
Subjects:
Ingeniería
Thin films
Microcontroller
Direct liquid injection
Chemical vapor deposition
Online Access:
Acceder al recurso 1 Acceder al recurso 2 Acceder al recurso 3 Acceder al recurso 4 Acceder al recurso 5
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Internet

https://www.redalyc.org/articulo.oa?id=47454151009
https://www.redalyc.org/journal/474/47454151009/
https://www.redalyc.org/journal/474/47454151009/html/
https://www.redalyc.org/journal/474/47454151009/47454151009.epub
https://www.redalyc.org/journal/474/47454151009/movil

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